Dinglong Co., Ltd. issued an announcement stating that a certain immersion ArF wafer photoresist and a certain KrF wafer photoresist product produced by the company's controlling subsidiary, Dinglong (Qianjiang) New Materials Co., Ltd., have successfully passed customer verification, and recently received orders from two domestic mainstream wafer factory customers, with a total purchase amount of more than one million yuan.
It further stated that this first order for high-end wafer photoresist is another major market breakthrough after the company successively introduced display panel photoresist and advanced packaging photoresist to clients and achieved sales. It will further enhance the company's overall innovation capabilities in the three major photoresist application fields of semiconductors and pan-semiconductors, broaden customer service capabilities, and consolidate the company's competitive advantages in the field of import-substituting innovative materials platform enterprises.
As a platform company for various core "bottleneck" import-substituting innovative materials, Dinglong has deployed more than 20 high-end wafer photoresists, all of which are models actively commissioned by customers, many of which have not yet been broken through in China. So far, the company has 2 products that have passed customer verification tests and obtained purchase orders, and another 8 products are in the customer testing stage. The overall testing is progressing smoothly, and the remaining models are in R&D and internal testing.
Based on the company's technical advantages in organic synthesis (monomers, PAGs, Quenchers and other photoresist small molecule component development platforms), polymer synthesis (photoresist resin development platform), OLED panel photoresist and semiconductor advanced packaging photoresist development accumulation, engineering equipment design, etc., as well as the company's close cooperation with mainstream wafer manufacturers through semiconductor CMP process materials, Dinglong Co., Ltd. designs monomer structure, resin structure, formula, etc. according to the technical requirements of KrF and ArF photoresists, improves the process levels of purification, filtration, mixing, etc., and develops special resins for KrF and ArF photoresists and their high-purity monomers, photoacid generators and other key materials and photoresist products, realizing the independent and controllable localization of the entire process from key materials to photoresist products, meeting the needs of downstream customers for safe and independent control of the industrial chain and supply chain.
