So, in English, is this EUV prototype any good or is it a lemon? How competitive is it against the state of the art?The 0.75nm RMS is important in regards to development of the optical surfaces.
13.5nm is due to the materials being used (tin droplet), the "linewidth":
View attachment 60004
Line width is effectively resolution I think.
If you look at how people define their gates, the 14nm and whatever don't mean much. You need full details how the node.
From wikichip:
View attachment 60005
Where's the original text?
@Pkp88
Only the second paragraph has anything remotely interesting, the rest is just blather about their New Year's party. I don't understand the numbers in the second paragraph either, especially the 110nm - are they still wasting time on a 110nm machine?I would like to direct attention to the below article I found (Jan 2020) from the Chinese Academy of Sciences in relation to work on Lithography.
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