The original article is in the Changchun Institute of Optics Website. CIT also has a subsidiary in Beijing called RS Laser which produces Arf Laser for Lithography.
Looks like they managed to produce a EUV Lithography machine with resolution of 22 - 32nm back in 2017. Not bad.
Main problem with EUV is the patents held by ASML.
Now with EUV sales to China being restricted by Wasenaar Agreement, the patents are no longer applicable in China.
I expect China to start the EUV Lithography project officially soon.
It can't be just those academy science guys doing their things. The leading industrial heavyweights have to endorse them and actively implement them. The Huawei, ZTE, SMIC , Huahong grace all have to jump onboard and put them into practical usage. The problem I see no big Chinese industrial guys actively investing and promoting domestic EUV technology
Just as ASML was actively funded by Intel, Samsung , TSMC.