This is the Google Translate of the link given by "superdog" at Chinese Semiconductor Industry Thread . I think it's also relevant to this thread.
"Research on Key Technologies of Extreme Ultraviolet Lithography" Passed Acceptance
Recently, the acceptance meeting of the "Extreme Ultraviolet (EUV) Lithography Key Technology Research" project was held at the Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences (hereinafter referred to as the Changchun Institute of Optics and Mechanics). "Manufacturing equipment and complete sets of technology" National Science and Technology Major Project (02 Project) Implementation Management Office organization. At the meeting, the panel of reviewing experts affirmed the series of results achieved by the project and agreed that the project passed the acceptance. They believed that the smooth implementation of the project has advanced an important step in the development of China's extreme ultraviolet lithography technology. Extreme ultraviolet lithography is a projection lithography technique that uses extreme ultraviolet light with a wavelength of 13.5 nm as the working wavelength, which is a reasonable extension of traditional lithography techniques to shorter wavelengths. As the next generation of lithography technology, extreme ultraviolet lithography has been given the mission of saving Moore's Law by the industry.
Jin Chunshui, a researcher at the State Key Laboratory of Applied Optics of Changchun Institute of Optics, told the reporter of China Science Journal: "Extreme ultraviolet lithography optical technology represents the highest level of current applied optics development. As a prospective EUV lithography key technology research, project indicators require High, technical difficulty, bottlenecks, high innovation, and serious foreign technical blockade. " Since the 1990s, Changchun Optoelectronics Institute has focused on EUV / X-ray imaging technology research, focusing on EUV light source, ultra-smooth polishing technology, EUV multilayer film and related EUV imaging technology research, forming an extreme ultraviolet optical Application technology foundation. In 2002, the first set of domestic EUV lithography principle device developed by Changchun Institute of Optoelectronics realized the principle of EUV lithography. In 2008, the national "Very Large Scale Integrated Circuit Manufacturing Equipment and Complete Process" major scientific and technological project listed EUV lithography technology as an important research task of "prospective research on 32-22nm equipment technology." As the lead unit, Changchun Institute of Optoelectronics undertook the research work of the "Key Technology Research of Extreme Ultraviolet Lithography". The member units also include the Institute of Optoelectronic Technology, Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, and Institute of Microelectronics, Chinese Academy of Sciences , Beijing Institute of Technology, Harbin Institute of Technology, Huazhong University of Science and Technology.
The research team of the Changchun Institute of Optics and Mechanics led by Jin Chunshui adheres to the persevering scientific research spirit, concentrates on research, and has accumulated a lot of hard work. After eight years of hard work, it has broken through the ultra-high-precision aspheric processing and inspection that restrict the development of extreme ultraviolet lithography in China Multi-layer film, projection objective system integration test and other core unit technologies, successfully developed a two-mirror EUV lithography objective system with a wave aberration better than 0.75 nm RMS, constructed an EUV lithography exposure device, and obtained EUV projection lithography for the first time in China 32 nm line width photoresist exposure pattern.
Jin Chunshui said: "We have established a relatively complete R & D platform for key technologies of exposure optical systems, successfully completed the research content and mission goals of major national special deployments, achieved EUV optical imaging technology leapfrogging, and significantly improved the core optical technology of extreme ultraviolet lithography in China Level."
At the same time, the implementation of the project has formed a stable research team, which lays a solid technical and talent base for China to achieve sustainable development in the next generation of lithography technology.
At the acceptance meeting, Jia Ping, director of the Changchun Institute of Optics, pointed out that the layout of the EUV project is in the window period in terms of timing and technical difficulty, and hopes that the country will provide continuous and stable support. He encouraged the project participating units to give full play to the advantages of the EUV discipline, to brave the courage to work side by side, and to achieve better results with follow-up support.
02 Tian Chun, the chief technical officer of the special general group and the director of the Institute of Microelectronics of the Chinese Academy of Sciences, also emphasized that under the situation that the international EUV lithography large production base has been established, China ’s EUV lithography research should continue to adhere to the future industrial engineering needs The focus should be on the core technologies that must be mastered and the possible breakthroughs in innovation.
In addition, Ye Tianchun commented that the lithography team of the Changchun Institute of Optical Machinery is the team that undertakes the most core, highest-end and most difficult tasks, and is also the most combative, most stress-resistant and most trustworthy main force in the special team. He encouraged the project team to shoulder the responsibility and sense of mission of major tasks and continue to climb the peak. 02 Cao Jianlin, chief commander of the special lithography machine engineering headquarters and former vice minister of the Ministry of Science and Technology, is one of the experts in the field familiar with EUV lithography in China. He believes that China has initially possessed the R & D capabilities of lithography technology and is moving towards the industrialization goal. The "Chinese lithography dream" 30 years ago is gradually becoming a reality. The establishment of the lithography technology R & D capability in China has initially established its adherence Confidence in the Chinese lithography dream. (Shen Chunlei) China Science News (2017-07-10 5th Edition Innovation Weekly)
