You are using an out of date browser. It may not display this or other websites correctly.
You should upgrade or use an alternative browser.
You should upgrade or use an alternative browser.
Germany Carl Zeiss, heart of Dutch ASML Lithography Equipment.
- Thread starter tidalwave
- Start date
- Status
- Not open for further replies.
There has been a recent breakthrough in DUV Lithography in China.
SMEE has just in April 2020 newly developed a 22nm Dual Stage Immersion Lithography machine. This means SMEE has caught up with ASML in DUV Lithography machine technology.
When released, it will be able to produce 7nm Chips using Multi Patterning.
This is a step forward in China being able to produce the latest Chips using locally made Lithography equipment.
The next step is for China to start the Project for EUV Lithography Machines in order to produce Chips 5nm and smaller.
Will forward the article soon.
Source please
Its mentioned in the article with link. There is no press release yet as its just been developed in April. Closer to release of machine there will be more write up.Source please
This article talks about SMEE latest 22nm Lithography machine.
Because DUV lithography equipment is available from ASML and possible Tokyo electron, SMEE can take its time to make this for backup purpose which it is. The article says that 22nm tech is still some distance away from industrialization but no hurry.
EUV is completely different technology and is much more urgently needed and should be prioritized and mobilized the country as a whole to tackle this issue.
Yes......i agree. China should get started straight away with a EUV Project as there is no time to lose. Companies like Huawei need to produce the best Chips within China with preferably locally made equipment.Because DUV lithography equipment is available from ASML and possible Tokyo electron, SMEE can take its time to make this for backup purpose which it is. The article says that 22nm tech is still some distance away from industrialization but no hurry.
EUV is completely different technology and is much more urgently needed and should be prioritized and mobilized the country as a whole to tackle this issue.
With the new 22nm DUV from SMEE, SMIC can produce Chips for Huawei without worry of sanction from US Government.
The biggest loser eventually will be ASML as its refusal to sell EUV in China & the competition from SMEE in DUV will reduce its market share in China. Same goes with US Chip production equipment vendors who will face greater competiton from local equipment makers.
In the case of SMEE, with the experience gained developing DUV Lithography machines, SMEE would be the best candidate to lead in developing a EUV Lithography machine in China. Like ASML, first DUV then proceed to EUV. The China Tech Big Fund should be giving SMEE funding for EUV development.
On another note, i noticed that Gigaphoton of Japan which makes EUV Co2 Laser light sources is expanding its presence in China. I believe Gigaphoton is interested in getting involved in any new EUV project in China. It currently does not supply its EUV light source to ASML.
Yes......i agree. China should get started straight away with a EUV Project as there is no time to lose. Companies like Huawei need to produce the best Chips within China with preferably locally made equipment.
With the new 22nm DUV from SMEE, SMIC can produce Chips for Huawei without worry of sanction from US Government.
The biggest loser eventually will be ASML as its refusal to sell EUV in China & the competition from SMEE in DUV will reduce its market share in China. Same goes with US Chip production equipment vendors who will face greater competiton from local equipment makers.
In the case of SMEE, with the experience gained developing DUV Lithography machines, SMEE would be the best candidate to lead in developing a EUV Lithography machine in China. Like ASML, first DUV then proceed to EUV. The China Tech Big Fund should be giving SMEE funding for EUV development.
On another note, i noticed that Gigaphoton of Japan which makes EUV Co2 Laser light sources is expanding its presence in China. I believe Gigaphoton is interested in getting involved in any new EUV project in China. It currently does not supply its EUV light source to ASML.
I think the scenario how to put this together would be Central government ministry of science and technology forming a task force to supervise this EUV national level project with funding from National IC Big Fund.
1)The organization with the most EUV research is Chancun institute of Optics, ciomp.ac.cn. China academy of science. It's role is to supply the EUV mirrors and optical design.
2)SMEE is a commercial entity with the most expertise in putting everything together system wise. It's an integrator.
3)I would not trust Japanese parts into this. Rather have The Institute of Electronics, as a part of Chinese Academy of Sciences (CAS), started the gas laser research since early 60's of the last century. It's role is to provide laser produced EUV light source.
Those 3 organizations will work together funded by National IC big fund and supervised by central government Ministry of science and technology task force.
That how I envision China can pull this off.
first step is have a central government recognize EUV as national project and provide funding and setup special task force.
I think very likely the EUV Project will be included in the next 5 year plan 2021 - 2025. So earliest we can see a prototype will be mid-way through the plan.I think the scenario how to put this together would be Central government ministry of science and technology forming a task force to supervise this EUV national level project with funding from National IC Big Fund.
1)The organization with the most EUV research is Chancun institute of Optics, ciomp.ac.cn. China academy of science. It's role is to supply the EUV mirrors and optical design.
2)SMEE is a commercial entity with the most expertise in putting everything together system wise. It's an integrator.
3)I would not trust Japanese parts into this. Rather have The Institute of Electronics, as a part of Chinese Academy of Sciences (CAS), started the gas laser research since early 60's of the last century. It's role is to provide laser produced EUV light source.
Those 3 organizations will work together funded by National IC big fund and supervised by central government Ministry of science and technology task force.
That how I envision China can pull this off.
first step is have a central government recognize EUV as national project and provide funding and setup special task force.
Arf is for DUV.
This is article about RS Laser subsidiary of Changchun Inst of Optics which makes Immersion Laser Arf Light Source for Lithography.
for EUV, needs much powerful CO2 laser to zap tin into plasma.
I think they already got some demonstration prototype in academics since 2002, just need to put it together for commercial ., of course for HVM it will be different spec.I think very likely the EUV Project will be included in the next 5 year plan 2021 - 2025. So earliest we can see a prototype will be mid-way through the plan.
2002年，长春光机所研制国内第一套EUV光刻原理装置，实现了EUV光刻的原理性贯通。2008年国家“极大规模集成电路制造装备及成套工艺”科技重大专项将EUV光刻技术列为“32-22nm装备技术前瞻性研究”重要攻关任务。长春光机所作为牵头单位，承担起了“极紫外光刻关键技术研究”项目研究工作，成员单位还包括中国科学院光电技术研究所、中国科学院上海光学精密机械研究所、中国科学院微电子研究所、北京理工大学、哈尔滨工业大学、华中科技大学
- Status
- Not open for further replies.