Chinese semiconductor thread II

huemens

Junior Member
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BEUV(Beyond EUV Lithography)

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Some Russian researchers recently proposed a plan for an 11.2nm light source.
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The Institute of Microstructure Physics of the Russian Academy of Sciences (via Dmitrii Kuznetsov) has laid out a long-term roadmap for domestic extreme ultraviolet (EUV) lithography tools operating at a wavelength of 11.2 nm, extending the information the organization shared last December.
The very first thing that strikes the eye is that the proposed EUV* systems avoid replicating the architecture of ASML's tools. Instead, the plan is to use an entirely different set of technologies: hybrid solid-state lasers, xenon plasma-based light sources, and mirrors made from ruthenium and beryllium (Ru/Be) that reflect light at a 11.2nm wavelength. The choice of xenon instead of tin droplets in ASML's EUV tools eliminates debris that harms photomasks, which dramatically reduces maintenance. Meanwhile, when compared to ASML's DUV tools, the lower complexity is meant to avoid high-pressure immersion fluids and multi-patterning steps for advanced nodes.
 

tokenanalyst

Lieutenant General
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Mr.TPL: A Method for Multi-Pin Net Router in Triple Patterning Lithography.​


University of Science and Technology Beijing.
Tsinghua University
Empyrean Technology Co., Ltd., Beijing, China


Abstract—Triple patterning lithography (TPL) has been recognized as one of the most promising solutions to print critical features in advanced technology nodes. A critical challenge within TPL is the effective assignment of the layout to masks. Recently, various layout decomposition methods and TPL-aware routing methods have been proposed to consider TPL. However, these methods typically result in numerous conflicts and stitches, and are mainly designed for 2-pin nets. This paper proposes a multipin net routing method in triple patterning lithography, called Mr.TPL. Experimental results demonstrate that Mr.TPL reduces color conflicts by 81.17%, decreases stitches by 76.89%, and achieves up to 5.4× speed improvement compared to the state-of the-art TPL-aware routing method.​

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tokenanalyst

Lieutenant General
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Arctic Xiongxin GPU chip lights up.​


Arctic Xiongxin has successfully powered up its QM935-G1 IVI chiplet, a high-performance component designed for intelligent vehicle cockpits. Featuring a 1.3TFLOPS GPU and 51.2GB/s memory bandwidth, it supports advanced multimedia functions (like HiFi5 and UFS) and enables secure isolation between instrument clusters and entertainment systems.​

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To meet the growing demand from AI-driven smart cockpit and autonomous driving applications, Arctic Xiongxin leverages chiplet technology to offer modular, scalable solutions:

The QM935-C08 combines one QM935-G1 GPU chiplet with HUB and Ursa Major AI chiplets, delivering up to 128GB/s memory bandwidth, ideal for large-scale AI operating systems (AIOS) and integrated cockpit platforms.
The QM935-A04 four-core module delivers 800TOPS computing power, enabling distributed AI processing for next-generation intelligent driving (VLA).
The QM935-G1 can act as a co-processor to enhance GPU rendering, addressing limitations in current cockpit chips.
Using its proprietary PBLink interconnect, the chip supports flexible memory expansion, enabling smooth multi-screen interaction, ultra-high-resolution displays, and real-time 3D rendering—ideal for AAA games, digital twins, and high-precision maps. This also allows for fast, offline AI assistant functionality with strong reasoning and multi-turn conversation capabilities.

With advancements in large model deployment, Arctic Xiongxin is positioning itself as an AI infrastructure provider for automotive applications, focusing on chiplet-based design and near-memory computing to support edge AI, vehicle-side intelligence, and future autonomous driving. The company aims to deliver cost-effective, high-performance "one-board" solutions that meet evolving demands in smart vehicles.​

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tokenanalyst

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Mechanistic Insights into Acid Generation from Nonionic Photoacid Generators for Extreme Ultraviolet and Electron Beam Lithography.​

Abstract​

Nonionic photoacid generators (PAGs) have emerged as key components in advanced extreme ultraviolet (EUV) and electron beam (EB) photoresists, offering advantages such as low dark loss, reduced outgassing, and suppressed phase separation. However, the lack of molecular-level understanding of their acid generation mechanisms hinders rational design and leads to reliance on trial-and-error synthesis. In this study, we perform a comprehensive density functional theory (DFT) investigation on 22 representative nonionic PAGs to elucidate their postexposure reaction pathways, encompassing bond dissociation, byproduct formation, and proton transfer mechanisms. Our findings reveal four distinct electron-triggered dissociation modes, including productive N–O/C–O bond cleavage and competing, nonproductive S–O bond cleavage. We identify the relative energy barrier between productive and unproductive pathways as a critical descriptor for photoacid generation efficiency and, by extension, photoresist sensitivity. Moreover, we demonstrate that molecular conformation (bent vs extended) and electron-withdrawing or electron-donating substituents profoundly impact the selectivity of bond dissociation. Importantly, this study also clarifies the roles of various proton sources (phenolic −OH+, t-BOC+ protecting groups, and intermediates during byproduct formation) in facilitating acid formation. Our analysis quantifies the energy barriers associated with each route, highlighting structure-dependent modulation of acid generation efficiency. These insights collectively establish a structure–mechanism–function relationship for nonionic PAGs and offer a predictive framework for designing next-generation high-sensitivity PAGs tailored for advanced lithographic applications.

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tokenanalyst

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300,000 tons of high-purity quartz sand and 10,000 quartz crucibles project will be launched in Shandong​


Recently, the People's Government of Shanting District, Zaozhuang City, issued a public announcement on the acceptance of environmental impact assessment documents for Shandong Jingbo Energy Technology Co., Ltd.'s high-purity quartz sand and quartz crucible production project.
Shandong Jingbo Energy Technology Co., Ltd. invested 120 million yuan to purchase ball mills , drum screens, magnetic separators, pickling tanks, steam boilers, dryers , color sorters and other equipment to build a high-purity quartz sand and quartz crucible production project.
The project uses quartz sand, hydrochloric acid and other raw materials, and manufactures high-purity quartz sand through processes such as feeding, screening, ball milling, screening, desludging, magnetic separation, separation, pickling, deacidification, drying, color sorting, and fine grinding; uses high-purity quartz sand, barium hydroxide and other raw materials, and manufactures quartz crucibles through processes such as arc melting, demolding, sandblasting, cutting, pickling, water washing, drying, and barium coating. After completion, the project will achieve an annual output of 300,000 tons of high-purity quartz sand and 10,000 quartz crucibles.

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