I missed something cause focusing on SanWenYu's response to my post.
HUST 10KW for main laser still low.
Gigaphoton has 20KW
Cymer's HVM I has a 30 kW laser and a 105 W EUV output.
HUST still need to bump it several times higher.
Chinese semiconductor thread II
- Thread starter vincent
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HUST 10KW for main laser still low.
Gigaphoton has 20KW
Cymer's HVM I has a 30 kW laser and a 105 W EUV output.
HUST still need to bump it several times higher.
In Chinese language, 10kw level can mean 10kw to somewhat less than 100kw
HUST is just one of many light sources are in mainland ..
CIOMP/HIT just delivered 13.5nm EUV light source and its been months already. they have won highest provincial award from the government. here is the screen-shot of this news. translate it.
HIT/CIOMP light source is going to be use in China's first LPP-EUV..
if you want, i can post CIOMP CO2 EUV laser official patent as well. that too back in 2022..
my point is, HUST is the not even main player in whole EUV saga. they are one of the players in mainland.
China has 2/3 working EUV light source for commercial purpose. Shanghai/Changchun/Harbin are top three..
Yes 10kW is lower than 20kW but you are comparing a university research work to a commercial product. Not to mention that the former is actually said to be "at the 10kW-level" which could be anywhere between 10kW and 99kW, as pointed out by vincent.
And we don't know whether Prof. Li is still working on his 10kW-level CO2 laser for greater output or he might have already concluded his job and handed it over to a commercial entity where the design can perhaps be simply enlarged to get the desired result.
What are numbers for this EUV output power from Harbin?
more than 10 years ago ASML has only 10W EUV output. So it has humble beginning.
current is about 250W in production, and demonstrated as high as 300W
future roadmap is 600W.
Yeah,
thats what I thought, it's University demo unit.
Another possibility. The Chinese EUV lithography machine might not even need a 20kW laser at the first place. The "10kW-level" laser could be a prototype, a demo unit, or the real thing. We don't know enough to draw conclusion.
From Chinese forum:
[2024 Advanced Lithography Technology Seminar - 2024 China Optical Valley·Optoelectronic Information Industry Innovation and Development Conference-Bilibili] m web link
I mainly read two expert reports. One is Academician Chen Xuedong of Huazhong University of Science and Technology, who is responsible for the nano-precision motion control of the lithography machine, that is, compensating for various mechanical, optical, electromagnetic, and thermal errors. The main content is summarized as follows:
1. 90nm is already mature, but the market is not large. The immersion type is being debugged and is "just around the corner."
2. The vacuum active shock absorption and magnetic levitation workbench of EUV have been prototyped and meet the index requirements.
The second person is Ding Chengyuan, who is responsible for the research and development of EUV light sources at the Shanghai Institute of Optics and Fine Mechanics. From what he said, he should have worked in ASML and led the team to work on light sources. The main content is
1. The requirements for lithography machines are only to do and not to say, and the details cannot be disclosed.
2. The main difficulty of EUV relative to DUV is the light source. The biggest difficulty of the light source for China is the high-power carbon dioxide laser. At present, the latest high-power carbon dioxide laser of ASML is the most difficult to produce in China. NA is a 40kw laser. It was only a few million when the domestic 02 project was accepted. Now it has several kilowatts, which is still an order of magnitude difference. Fiber lasers cannot be used for EUV because the pulse energy is not enough.
3. Lasers are not difficult for ASML because TRUMPF lasers are already very good. At that time, the difficulty of EUV was how to shoot targets, make targets, eliminate reflections and self-excitation, clear dirt, etc., but these do not need to be re-stepped for China. The technical route is very clear, and the main thing is engineering.
[2024 Advanced Lithography Technology Seminar - 2024 China Optical Valley·Optoelectronic Information Industry Innovation and Development Conference-Bilibili] m web link
I mainly read two expert reports. One is Academician Chen Xuedong of Huazhong University of Science and Technology, who is responsible for the nano-precision motion control of the lithography machine, that is, compensating for various mechanical, optical, electromagnetic, and thermal errors. The main content is summarized as follows:
1. 90nm is already mature, but the market is not large. The immersion type is being debugged and is "just around the corner."
2. The vacuum active shock absorption and magnetic levitation workbench of EUV have been prototyped and meet the index requirements.
The second person is Ding Chengyuan, who is responsible for the research and development of EUV light sources at the Shanghai Institute of Optics and Fine Mechanics. From what he said, he should have worked in ASML and led the team to work on light sources. The main content is
1. The requirements for lithography machines are only to do and not to say, and the details cannot be disclosed.
2. The main difficulty of EUV relative to DUV is the light source. The biggest difficulty of the light source for China is the high-power carbon dioxide laser. At present, the latest high-power carbon dioxide laser of ASML is the most difficult to produce in China. NA is a 40kw laser. It was only a few million when the domestic 02 project was accepted. Now it has several kilowatts, which is still an order of magnitude difference. Fiber lasers cannot be used for EUV because the pulse energy is not enough.
3. Lasers are not difficult for ASML because TRUMPF lasers are already very good. At that time, the difficulty of EUV was how to shoot targets, make targets, eliminate reflections and self-excitation, clear dirt, etc., but these do not need to be re-stepped for China. The technical route is very clear, and the main thing is engineering.
All 3 presenters in this video provided valuable info regarding Chinese EUV development. I’m a little surprised such info was allowed to be publicly available. Regarding high power high repetition CO2 laser, here is prof Tang confirming in 2023 that HUST CO2 laser main amp achieved 10kw output, and seed/preamp lasers were going very well. Hopefully they can get to at least 20kw now, which should be sufficient for risk maybe hvm production assuming reasonable CE