Chinese semiconductor thread II
- Thread starter vincent
- Start date
Here comes the usual wafer capacity computation.
Starting from:
We have:
With reported 80% current yield we have: 712 dies per wafer. Each single die of 2GB.
Let's assume a generous memory of 32GB per server. It's DDR 5 memory for 44.5 servers per wafer.
With reported 50K wpm for the most advanced of the 2 fabs (the other makes DDR4), we have a full memory production capacity of 2.2M servers / month.
So currently, if CXMT dedicates fab 2 to DDR 5, it can supply more than 2M servers / month.
By end 2025 it should go (according to known plans) to 100K wpm at 90% yield -> 5M servers / month.
MTT X300 supports the acceleration of GIS, CAD, BIM applications and non-linear editing, comprehensively improves the performance of industrial software, and edits high-quality videos in real time. In terms of hardware parameters, MTT X300 is based on the second-generation MUSA architecture GPU core, built-in 4096 MUSA stream processing units, single-precision floating-point computing power reaches 14.4TFLOPS, equipped with 16GB GDDR6 video memory, bus interface PCIe 5.0 x 16, TGP power consumption 255W. It has 3 DP 1.4a and 1 HDMI 2.1 interfaces, supports H.265/H.264 and other video codecs, supports 4 displays output at the same time, up to 8K display
How many kilowatts?
EUV from ASML CO2 laser occupied several room sized.
Is the HUST one as big physically? Do they have a picture?
No picture/photo in that weixin post but there is an embedded video in which Prof. Tang said his CO2 laser has the output power of 3500W. How does this compare to ASML's?
This is from HUST ..
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There is one more from Harbin Institute of Technology(HIT) they have delivered 13.5nm EUV light source months ago.. also won the provincial award. posted on previous page of this thread.. i m quoting it for you
China has basically 2-3 working EUV light source for commercial purpose and HUST is one of them..
@SanWenYu 13.5nm is basically a required one for EUV, delivered by HIT.. this is equivalent to ASML's EUV.
Prof Tang’s team is responsible for RF slab CO2 laser, which is used in the preamp step of CO2 MOPA system. Trumpf’s preamp power is 100 W, so preamp power is not a problem. That 3.5KW is probably for spike laser annealing applications
Another team at HUST is responsible for mopa main amp laser development. They achieved 10 KW level in 2023, so power is no big issue
Also don’t forget dose control and beam quality parameters are as important as power for lppeuv drive laser systems.
That doesn't sound good.
Japan's Gigaphton CO2 laser for EUV output power is 20KW. That's 6 times of this.
I think this HUST laser is lab demo purpose , not really for commercial production purpose.
I think this University program needs to partner with state owned laser weapon companies in order to bump to that level of power. Several room sized equipment is beyond university program calibur.
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you completely ignore what @interestedseal posted. and for your kind information HUST has complete facility and HUST is located in Wuhan city. Wuhan city is also known as Laser/Optics capital of China..
HUST successfully achieved 10KW level in 2023, so power is no big issue.
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