Chinese semiconductor thread II

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OptimusLion

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For 7nm and below nodes! #Shanghai Microelectronics discloses invention patent for "Extreme Ultraviolet Radiation Generator and Photolithography Equipment"#

Tianyancha shows that #Shanghai Microelectronics# Equipment (Group) Co., Ltd. disclosed an invention patent called "Extreme Ultraviolet Radiation Generator and Photolithography Equipment" on September 10. The application date is March 9, 2023, and the application number is CN202310226636.7. The inventors are Wang Weiwei, Fu Hui, Lu Jiaxi, Zhang Hongbo, Cai Wanchong, and Zhang Zichen.
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GiantPanda

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OptimusLion said:
For 7nm and below nodes! #Shanghai Microelectronics discloses invention patent for "Extreme Ultraviolet Radiation Generator and Photolithography Equipment"#

Tianyancha shows that #Shanghai Microelectronics# Equipment (Group) Co., Ltd. disclosed an invention patent called "Extreme Ultraviolet Radiation Generator and Photolithography Equipment" on September 10. The application date is March 9, 2023, and the application number is CN202310226636.7. The inventors are Wang Weiwei, Fu Hui, Lu Jiaxi, Zhang Hongbo, Cai Wanchong, and Zhang Zichen.
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Anyone surprised that SMEE would have an EUV patent?

Multiple institutions -- SMEE, CIOMP, Huawei eventually.
 
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OptimusLion

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Nuclear Power Innovation (Wuxi) Technology Co., Ltd., a subsidiary of the State Power Investment Corporation, and the Nuclear Technology (Power Chip Proton Irradiation) R&D Center of the National Atomic Energy Agency, have completed the delivery of the first batch of hydrogen ion implantation performance optimization chip products to customers. This indicates that China has fully mastered the core technology and process of high-energy hydrogen ion implantation in power semiconductors, and has completed an important missing link in China's semiconductor industry chain. Hydrogen ion implantation is an important link in semiconductor wafer manufacturing second only to lithography, and plays a key role in the manufacturing process of various types of semiconductor products such as integrated circuits, power semiconductors, and third-generation semiconductors. The lack of core technology and equipment technology in this field has seriously restricted the high-end development of China's semiconductor industry, especially the long-term dependence on imports of high-voltage power chips above 600V.

Under the unfavorable conditions of foreign key technology and equipment blockade, Nuclear Power Innovation has broken through a number of key technical barriers in less than 3 years, achieved 100% independent technology and 100% equipment localization, and built China's first cross-disciplinary R&D platform in the field of nuclear technology application and semiconductors.

The first batch of chip products delivered underwent nearly 10,000 hours of process and reliability testing and verification. The main technical indicators reached the international advanced level and were highly praised by users.

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OptimusLion

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OptimusLion said:
For 7nm and below nodes! #Shanghai Microelectronics discloses invention patent for "Extreme Ultraviolet Radiation Generator and Photolithography Equipment"#

Tianyancha shows that #Shanghai Microelectronics# Equipment (Group) Co., Ltd. disclosed an invention patent called "Extreme Ultraviolet Radiation Generator and Photolithography Equipment" on September 10. The application date is March 9, 2023, and the application number is CN202310226636.7. The inventors are Wang Weiwei, Fu Hui, Lu Jiaxi, Zhang Hongbo, Cai Wanchong, and Zhang Zichen.
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tokenanalyst

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The first phase of Huaye Gases' technical transformation project has officially started production, which will strongly support the pan-semiconductor and other industries​


The commissioning ceremony of Zhengfan Technology's "Suzhou Huaye Gas Manufacturing Co., Ltd. Phase I Technical Transformation Project" was held at Suzhou Huaye Gas Company.

Zhengfan Technology officially acquired Huaye Gas on September 9, 2022. Huaye Gas's technical transformation project focuses on the production and filling of high-purity gases, and has introduced the country's leading automated filling equipment, which improves the filling safety performance while also improving the quality of the product. After the project is officially put into production, the annual filling volume will reach 1.8 million bottles, with the ability to fill high-end 200bar cylinders.

Shi Kecheng, President of Gensun Technology, said that the completion of the first phase of Suzhou Huaye Gas has enriched the product categories supplied by Gensun Technology in the core area of the Yangtze River Delta, strengthened the supply capacity of high-purity electronic carrier gas, and strongly supported the development of the local semiconductor industry and advanced manufacturing industry. Based on the first phase project, Huaye Gas will also have a second phase, and even a subsequent three phases of projects. Gensun Technology strives to serve the surrounding customer groups in Suzhou Taicang with Huaye Gas as the central base.​

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OptimusLion

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Semiconductor giant Infineon Technologies recently announced that the company has successfully developed the world's first 300 mm (about 12 inches) power gallium nitride (GaN) wafer technology. Compared with the existing 200 mm wafers, 300 mm wafer technology means that more chips can be manufactured on a single wafer, thereby improving production efficiency and economies of scale. This technological advancement can not only increase the chip output per wafer by 2.3 times, but also help reduce production costs, making gallium nitride technology more economical and efficient.

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