Chinese semiconductor industry

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antiterror13

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You realize that 90 nm resolution doesn't mean 90 nm process node, because process node doesn't actually correlate with any specific feature size since 90 nm, right?

You also realize that 90 nm is close to the resolution limit for dry etch before immersion is required? And that 90 nm dry etch is competitive with Japanese lithography systems so at minimum it still has a market regardless of ASML?

Do you realize you can double resolution with a 90 nm dry etch system if you have a sufficiently high performance wafer stage and double pattern?

And you realize that 28 nm with double patterning can yield 7 nm class features (as 7 nm class doesn't mean actually 7 nm size) as Nikon has shown?

There is no indication that @nlalyst has any knowledge of it ... sadly ;)
 

nlalyst

Junior Member
Registered Member
SMEE's best system is not 90nm but 65nm, not counting currently made 28nm.

p.s Why don't you stay at the radar spamming threads at 054B? We all know that's why you came here to make a mess from this thread.
Sure. And this is based on what evidence?

Back in the real world, SMEE's best system is a prototype qualifed for the 90nm node, 8 generations behind the state-of-the-art (5nm). AFAIK, it has not recorded any sales of that tool. SMEE struggles to produce even photolithography steppers.

China's saving grace is that Moore's law is coming to an end, and there's possibly only 10 more years of advancements left before it becomes unprofitable to push the technology any further.
 
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FairAndUnbiased

Brigadier
Registered Member
What I actually said was that the SMEE's best system was qualified for a 90nm process. You claimed that 90nm actually refers to the physical resolution, of the system, but never provided any evidence. Do you have proof or not?

The one article that you did link confirms what I said:
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Video of 65 nm process node DUV dry lithography machine being delivered to a corporate customer for 3D packaging and integration purposes with a picture of the actual instrument being forklifted into the fab.

That is evidence in favor of 90 nm likely referring to physical resolution and not process node. However it must be noted that 65 nm and 90 nm are closely related and typically 90 nm uses 248 nm KrF or even mercury lamp rather than ArF, so 65 nm process node is the EXPECTED performance of an ArF instrument.
 

FairAndUnbiased

Brigadier
Registered Member
Back in the real world, SMEE's best system is a prototype qualifed for the 90nm node, 8 generations behind the state-of-the-art (5nm). AFAIK, it has not recorded any sales of that tool. SMEE struggles to produce even photolithography steppers.
Where is your evidence for any of this? 90 nm has no sales but we have video of 65 nm getting forklifted into a fab? Ok I guess we can accept that 90 nm has no sales known to you, but 65 nm has sales.
 

Overbom

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WTAN has already said multiple times about the 28nm DUV machine being already shipped to select customers and is now in trial production in those customers. In the following months the yield will gradually increase as the processes are optimised.

AFAIK H1/2022 full production of chips will start with the 28nm DUV machine.
 

antiterror13

Brigadier
WTAN has already said multiple times about the 28nm DUV machine being already shipped to select customers and is now in trial production in those customers. In the following months the yield will gradually increase as the processes are optimised.

AFAIK H1/2022 full production of chips will start with the 28nm DUV machine.

yeahh with 14nm chips mass produced in 2022 and 7nm in early 2023
 

nlalyst

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Video of 65 nm process node DUV dry lithography machine being delivered to a corporate customer for 3D packaging and integration purposes with a picture of the actual instrument being forklifted into the fab.

That is evidence in favor of 90 nm likely referring to physical resolution and not process node. However it must be noted that 65 nm and 90 nm are closely related and typically 90 nm uses 248 nm KrF or even mercury lamp rather than ArF, so 65 nm process node is the EXPECTED performance of an ArF instrument.
All it shows of this alleged SMEE system is a wooden box. But then they prop up the video with photos of ASML systems, because otherwise it would be 5 seconds long.

If this is really true, then it shouldn't be difficult to find an official statement made by SMEE. Otherwise, how do we know this isn't yet another prototype?

To put this in perspective, ASML shipped its first EUV tools (demo tools) to customers way back in 2006:
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But it wasn't until 2018 that EUV matured enough for high volume manufacturing.
 

FairAndUnbiased

Brigadier
Registered Member
All it shows of this alleged SMEE system is a wooden box. But then they prop up the video with photos of ASML systems, because otherwise it would be 5 seconds long.

If this is really true, then it shouldn't be difficult to find an official statement made by SMEE. Otherwise, how do we know this isn't yet another prototype?

To put this in perspective, ASML shipped its first EUV tools (demo tools) to customers way back in 2006:
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But it wasn't until 2018 that EUV matured enough for high volume manufacturing.
I heard you like announcements, how about one from the customer?

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How about another source?

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