This might seem like a silly question, but why couldn't you just hold the vacuum for a while before you start the EUV so all the trapped gases have time to desorb? Also, the optics at least have minuscule surface defects (they must to refract and reflect the EUV light properly), so won't that mean there's also very few nanoscale surface pockets to trap a gas?
Why wouldn't all this work be being done now and the 2025 projections already take it into account? I assume "a part is complete" or a "component has been delivered" means it's been certified to work under vacuum.
The problem with vacuum cycling is that cycling down to a high enough vacuum to avoid EUV absorption takes a long time due to water vapor desorption (reducing yield), and water can catalyze photopolymerization for trace organic contaminants. Even with dry gas purge,
since the partial pressure of water in the ambient air is going to be far higher than the dry gas purging.
And whatever part you're cycling vacuum for, that part still has to be vacuum compatible. Indeed, some materials that are not vacuum cycling compatible, are actually compatible for 100% under vacuum, such as materials which has high gas permeability (thus can trap gases if allowed to cycle to air) but no native outgassing of its own (meaning if its 100% under vacuum it stays low outgassing).
Since you need vacuum for etch and deposition anyways, it's much easier to just have everything be under vacuum and only have a few vacuum-atmosphere transitions.