@Vichysoy Not a tech expert but using the previous post of our esteem member as a guide, here are my findings.Hi ansy ! Do you have any information about this ? Pls , thanks !!
this happen in 1999
ASML Joins EUV-LLC Team
Lithographic stepper manufacturer ASM Lithography (ASML; Veldhoven, The Netherlands) has signed a contract with the Extreme Ultraviolet Limited Liability Co. (EUV-LLC) to participate in the EUV-LLC program. The EUV-LLC is a consortium to develop EUV wafer-fabrication technology. Members include the major US semiconductor companies Intel (Santa Clara, CA), Motorola (Schaumburg, IL), and Advanced Micro Devices (AMD; Sunnyvale, CA), and the Department of Energy's (DOE's) Lawrence Livermore, Sandia, and Berkeley National Laboratories.
As part of the program, ASML will work with the EUV-LLC to develop EUV lithography. The company is also researching the electron-beam technology known as SCALPEL in a separate cooperative effort with Applied Materials (Santa Clara, CA) and Lucent Technologies (Murray Hill, NJ). ASML is also working in the European program IPL with, amongst others, Infineon (Santa Clara, CA), IMS, and Leica (Deerfield, IL) on the development of ion-beam lithography.
and DARPA is a participant
SEMATECH was conceived in 1986, formed in 1987, and began operating in , in 1988 as a partnership between the United States government and 14 U.S.-based semiconductor manufacturers to solve common manufacturing problems and regain competitiveness for the U.S. that had been surpassed by Japanese industry in the mid-1980s. SEMATECH was funded over five years by public subsidies coming from the via the (DARPA) for a total of $500 million.
At that time Japan is a major player in DUVL and hold a monopoly with NIKON , CANON and Toshiba. with ASML they had diminished that lead and with EUVL monopolized it. Forcing Japan to do the same in 2011 with mixed result.
LONDON – A Japanese joint venture formed to hasten the adoption of Extreme Ultra Violet (EUV) lithography has begun collaborating with foreign chip companies including Intel, Samsung, Hynix and Taiwan Semiconductor Manufacturing Co. Ltd.
The EUVL Infrastructure Development Center Inc. (EIDEC) was formed in January 2011 as joint venture between chipmakers Renesas and Toshiba and equipment and Japanese materials suppliers: Asahi Glass Co. Ltd., Dai Nippon Printing Co., Ltd., Fujifilm Corp., Hoya Corp., JSR Corp., Nissan Chemical Industries Ltd., Shin-Etsu Chemical Co. Ltd., Tokyo Ohka Kogyo Co. Ltd. and Toppan Printing Co. Ltd.
The group now has external collaboration with chipmakers: Hynix, Intel, Samsung and TSMC, according to its website. It is also working with Osaka and Hyogo universities and Ebara Corp., Lasertec Corp. and Japan's National Institute of Advanced Industrial Science and Technology.
The joint venture, a follow on from the MIRAI and Selete consortia, is aiming to remove some of the barriers to the use of EUV lithography on 16-nm and 11-nm high performance processes and to promote the introduction of EUV lithography by 2015. It has a working base at clean room in the National Institute of Advanced Industrial Science and Technology.
The four main work items: blank EUV mask inspection, patterned EUV mask inspection, EUV resist outgassing control, and EUV resist material research.
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