Fuxiang Optics: Promoting photonic technology and empowering micro-nano manufacturing
In the field of semiconductor manufacturing, etching endpoint detection plays a decisive role and is a key link in ensuring chip manufacturing accuracy and cost control. Faced with the technical challenge of long-term dependence on imports, Fuxiang Optical has achieved a breakthrough in the field of etching endpoint detection with its independently developed EPD spectrometer ZURO product. It not only overcomes the technical bottleneck of dependence on imports, but also significantly improves manufacturing yield and efficiency.
As a national-level specialized and new "little giant" enterprise and the unit responsible for the integrated circuit support project of the Shanghai Municipal Science and Technology Commission, Fuxiang Optics has rich experience and profound technology accumulation in the field of micro-nano optical quantity detection, and has become China's advanced spectroscopic technology leader of. With the mission of empowering micro-nano manufacturing and promoting the advancement of photonic technology, the company has spent more than ten years polishing it. Relying on more than 100 independent intellectual property rights, it has mastered deep spectroscopy technology and can effectively combine it with customer scenarios to successfully develop a series of end-point detection products. , providing customers with a full range of solutions. It not only fills the domestic technology gap, but also proves its technological leadership on a global scale.
EPD spectrometer ZURO relies on its leadership in deep spectroscopy technology to effectively handle difficult processes such as plasma etching, reactive ion etching, deep hole etching, and atomic layer etching. Its high-performance features, such as effective detection of extremely low light intensity, high dynamic range exceeding 25000:1, and high signal-to-noise ratio in all signal sections, combined with the artificial intelligence end point judgment algorithm and neural network optimization technology of ideaEPD software, ensure The high precision and stability of the etching process can easily handle scenarios such as 3D NAND step etching, trench SiC MOSFET groove etching, ultra-small aperture ratio deep silicon etching, III-V compound semiconductor EPI structure etching, etc. end point judgment.
Fuxiang Optics' EPD spectrometer ZURO is running stably in many domestic Fab factories and has become the preferred partner of many well-known leading semiconductor companies. Its excellent technical performance and product quality have been highly recognized by the market and industry, demonstrating Fuxiang Optics' leading position in the fields of micro-nano optical quantity detection and depth spectroscopy technology and its significant contribution to the semiconductor industry.
In the future, Fuxiang Optics will continue to conduct in-depth research and innovation in spectrum technology, promote continuous product upgrades, and contribute to the sustainable development of the global semiconductor industry. Fuxiang Optics' technological breakthroughs and innovative practices have become an indispensable part of the domestic semiconductor manufacturing field, contributing the power of China's intelligent manufacturing to the progress of the global semiconductor industry.
