Shanghai Microelectronics’ patent for “projection objective optical system and lithography machine” announced
According to micronet news , Shanghai Microelectronics Equipment (Group) Co., Ltd. disclosed its latest lithography machine-related patents on November 28. According to Tianyancha, the patent published by Shanghai Microelectronics is called "Projection Objective Optical System and Lithography Machine", and the application publication number is CN117130226A...
The patent abstract shows that the present invention provides a projection objective optical system and a lithography machine. The projection objective optical system includes in order from the object surface to the image surface along its optical axis direction: a first lens group, a second lens group, Diaphragm, third lens group and fourth lens group. Wherein, the third lens group and the second lens group are symmetrical about the aperture, the fourth lens group and the first lens group are symmetrical about the aperture, and the projection objective optical system is symmetrical structure, and all lens groups in the projection objective optical system have positive refractive power, which can increase the field of view size of the exposure system and increase productivity on the basis of improving imaging quality..