these news are absolute b.s.
NIL has been around for decades. Its issue/weakness are with defectivity and real-time overlay correction. Just because they claim they could do 2nm doesn't mean they could actually do so in real HVM setting. Can't believe everything you read from any media, western or Chinese.
I don't know about process logic like finfets or GAA but Japanese and even some SK memory makers are REALLY looking into this technology.
They claim improvements in defectivity by using a special resist.
They claim improvements in overlay by using a moire interferometry technique.
in 2018 They claimed improvements in throughput now closer to the earlier shipped EUV tools.
How big will be the adoption by memory makers? Will that adoption and improvements lead to its adoption by fabs like TSMC,Samsung and SMIC? And the more relevant to this thread,
IF Canon is successful how this will affect the Chinese semiconductor equation?
This is relevant because China huge optoelectronics industry there are more players in the NIL space that there is in the projection lithography space "only one" and because NIL is export controlled by the Wassenaar the US will do anything to stop Canon from selling in China, that could lead to a
cut throat competition among Chinese NIL players wanting to enter the semiconductor field, but all of that will depend on the success of Canon.