GL300 Cluster is a modular, fully automatic nanoimprint production line that integrates a full set of process steps from nanoimprint substrate cleaning, gluing, baking, cooling to nanoimprinting. The standard Tianren Micronano CLIV (Contact Litho in Vacuum) imprinting technology can realize fully automatic high-precision (better than 10nm), high aspect ratio (better than 10:1) nanostructure replication and mass production on a 200/300mm substrate area. . The equipment adopts a modular design. Users can freely configure the number of modules for cleaning, gluing, baking, cooling, Plasma surface treatment, AOI detection, Post Cure and imprinting according to process needs and production rhythm to achieve optimal production efficiency. The equipment supports automatic working mold copying, automatic working mold replacement,automatic preprocessing and imprinting, and automatic demoulding. The entire process is carried out in a closed and clean environment to ensure the quality of the imprinting results.