Chinese semiconductor industry

tphuang said:

Got it. So for feature/resolution limit of 40nm, anything below 80nm would require multi-patterning?

I'm going to have to read up some materials on this. Thank you

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For simple 1D features, latest ArFi resolution is 38nm (76nm pitch). Referring to the CD pitch table that you were looking at, layers with CD pitch less than 76nm would require double patterning. By the same token, one you approach about 38nm pitch you’ll need quadruple patterning.

the N7 minimum metal pitch of 40nm would usually mean the line size is 20nm. Just remember the difference between feature size is the thickness of line or space. CD pitch is the width of one line/space pair. Don’t mix the two definitions.

SanWenYu said:

Not saying it is as effective as the western authorities want but it still makes it harder for sanctioned entities to use the open source software.

Open source is not about the source only which is usually not enough to reliably reproducce the software. Not mention that once you lose the access to the project, you are on your own even if you fork it.

It is the like with hardware, having the blueprints does not necessarily enables one to reverse engineer and reproduce it 100%. There are uncodified know-hows in engineering.

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Open source projects are forked all the time and sometimes the forked version are better than the original version.

Shenzhen is getting into EUV FEL.

The Shenzhen Computer Society's visit to the Shenzhen Integrated Particle Facility Research Institute was successfully completed Shenzhen
Computer Society 2023-04-19 15:00 Published in Guangdong

Finally, Dr. Fu Jinjiang, associate researcher at the Shenzhen Integrated Particle Facility Research Institute, wrote "Synchrotron Radiation Light Sources in Integration The report "Application of Extreme Ultraviolet Lithography Technology in the Circuit Industry" introduces the relevant knowledge of EUV lithography. EUV lithography is the mainstream path for sub-7 nm lithography process, and ASML is currently the only EUV lithography machine manufacturer in the world. The synchrotron radiation light source has the characteristics of continuously adjustable wavelength, no pollution and high stability. It has always played an extremely critical role in the development and commercialization of EUV lithography technology. Many countries have built specialized projects on their respective synchrotron radiation light sources. Line station for EUV lithography technology research and development. In order to break the international blockade and promote the development of China's integrated circuit technology, China urgently needs to further carry out research on EUV lithography technology. To this end, the Shenzhen Industrial Light Source System has planned a total of four beams including an extreme ultraviolet lithography line station and an extreme ultraviolet detection line station. line, six experimental stations .

Skyverse has upgraded and launched new equipment for Lithography metrology.​

In 23Q2, the company achieved revenue of 204 million yuan, +170% year-on-year and +26% month-on-month; net profit attributable to the parent company was 15 million yuan,
　
Product iterations and upgrades are smooth, and equipment coverage is expected to be significantly improved. The company attaches great importance to research and development, and the number of R&D personnel has grown steadily: 334 in 23H1, an increase of 12% from 298 in 22H1.

　　At the same time, the average salary of R&D personnel increased from 204,900 yuan in 22H1 to 239,400 yuan, which means that the R&D personnel structure has been further optimized. Under the strong R&D background, the iterative upgrades of the company's various equipment are carried out smoothly: 1) Patternless detection: the 1Xnm model has been successfully developed; 2) Pattern detection: models with three-dimensional detection functions have been verified by customers; 3) Three-dimensional topography measurement: Orders are growing steadily; 4) Film thickness measurement: dielectric film thickness actively covers more materials; metal film thickness covers more customer needs; 5) Overlay accuracy: 2Xnm models have been verified by head customers and have won many domestic leading Customer orders; 6) Bright/dark field: 2Xnm bright/dark field detection equipment has been successfully developed; 7) Critical dimensions: 2Xnm critical dimension measurement equipment has been successfully developed.

When all else fails, they double down on an extraterritorial decree.
The lawmakers urged the Biden administration to update the rules and take immediate action against Huawei and SMIC. They also urged the administration cut off Chinese companies' access to powerful artificial-intelligence chips accessed through cloud computing services and to start enforcing the administration's own rules around placing restrictions on Chinese companies that do not allow U.S. officials to verify whether Chinese companies are complying with U.S. export rules.

KYli said:

When all else fails, they double down on an extraterritorial decree.

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The lawmakers urged the Biden administration to update the rules and take immediate action against Huawei and SMIC. They also urged the administration cut off Chinese companies' access to powerful artificial-intelligence chips accessed through cloud computing services and to start enforcing the administration's own rules around placing restrictions on Chinese companies that do not allow U.S. officials to verify whether Chinese companies are complying with U.S. export rules.

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Sometimes I wonder if some people are trying to "reduce" Nvidia and AMD to benefit Intel.

Red Moon said:

Sometimes I wonder if some people are trying to "reduce" Nvidia and AMD to benefit Intel.

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Because they were owned and run by Chinese. and Intel is American poster boy, by hook and crook, they will Make Intel Great Again. (MIGA)

Guys, we have a thread for operating systems. I'm going to move all the discussions about this over there.

BlackWindMnt said:

Creating an instruction set can be hard, but it's far from impossible. Also China already has their own domestic designed instruction sets.

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Actually，creating a new instruction set is pretty easy. Average university can do that.

So far Huawei is sticking to ARM，no major RISC-V chip development from Huawei yet，don't know whether that's Huawei's strategy or not