Chinese semiconductor industry

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sinophilia

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However the first EUV capability that they get will almost certainly not be in the form of SSMB, which is the claim in question, and it is also why a few pages ago I said that it's stupid that news media are reporting about SSMB as if it is China's primary strategy in pursuing EUV lithography.

The actual success or timescale of EUV efforts will have no relation to political significance or relating to publicly announced policies like MIC 2025.


There's really no need to view things in any manner apart from an analytical lens.

When do you think commercial production might begin for the LPP one?

A speculative timeline might be helpful for those of us reading but not really understanding what's going on.
 

Blitzo

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When do you think commercial production might begin for the LPP one?

A speculative timeline might be helpful for those of us reading but not really understanding what's going on.

The very very earliest trial production could be 2025-2026, but the point is SSMB is almost definitely going to come after LPP, so people's focus on SSMB in relation to Chinese EUV efforts is thinking like at least 2-3 major milestones ahead.

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On a separate note, and this is written in general to everyone at large: it is obvious that the Chinese semiconductor industry is well into a collective, semi-"stealth" mode to pursue higher "operational security" than the semiconductor industries of other nations so as to pursue information asymmetry for purposes of geopolitical and geoeconomic prudence.

That is something we are all very used to for PLA watching, and I think most of us who have done PLA watching for a while are used to the importance of only tracking and following credible indicators and rumours and to disregard others, while doing so in a manner where people do not react as "fanboys" or a spectator crowd.


This forum really isn't meant to be Reddit tier in professionalism, and given this topic is one of sufficient gravity and there are some people in this thread who either know things and/or are able to reasonably surmise and tease out information and conclusions, I strongly recommend people here become more disciplined and hold yourself to a higher standard.
Try to avoid feeling happy or sad, and just observe instead.

In short, I implore some people to stop acting like the personification of this memed graph below:
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ansy1968

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When do you think commercial production might begin for the LPP one?

A speculative timeline might be helpful for those of us reading but not really understanding what's going on.
Hope this help from my mentor par excellence @WTAN circa 2021 two years ago, plus we are hearing rumors provided by @olalavn of a prototype EUVL LPP next year, so finger cross we may see a commercialized EUVL LPP by 2025.

WTAN

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Some news on Chinese development of LPP EUVL in Shanghai.

SMEE will officially begin development of EUVL using LPP Light Source next year.
There have been some changes to management in the parent company of SMEE (Shanghai Electric) which will see more funding for R&D going to SMEE.

Shanghai Institute of Optics have been making good progress in the development of the LPP EUV Light Source.
China has already developed a 10KW Pulsed MOPA CO2 Drive Laser for the Light Source in 2012/13.
Shanghai Inst is working on increasing the average power of the Drive Laser by adding more Laser Amplifiers.
Gigaphoton uses a 27KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
ASML uses a 30KW - 40KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
Experts say that Shanghai Inst should have no problems in developing an equally powerful MOPA CO2 Laser.
China has a mature Laser manufacturing Industry supply chain.
China already produces 15KW to 20KW Fast Axial Flow CO2 Lasers which are used as Amplifiers in the MOPA Laser System.
The Shanghai Inst Research in Light Source is going along well.
Target is 2025 for LPP EUVL introduction.

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FairAndUnbiased

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Caixing article (paywall):

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"The Chinese internet has been abuzz recently about news of a breakthrough by Chinese scientists developing an ultra-deep ultraviolet light source for photolithography — the key process for making semiconductors. The furor was exacerbated by claims that construction of a lithography machine factory is underway in Xiongan, near Beijing.

As a science writer and academic, many people have asked me to validate this news. So let’s set the record straight: The principle of this new light source is indeed real, but it was only proposed back in 2010 — the technology is still in the proof-of-concept phase and is at least 15 to 20 years away from practical application."
its the same SSMB and synchrotron principle we've been talking about for like the past 10 pages.
 

european_guy

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Guanshi Technology: After the Ningbo base is put into operation, it can achieve large-scale production of 45-28nm semiconductor photomasks​


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In terms of semiconductor masks, Nanjing Guanshi has invested in the construction of a semiconductor photomask production base in Ningbo City, Zhejiang Province. Once fully put into production, it can achieve large-scale production of 45-28nm semiconductor photomasks.
 

tphuang

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There are definitely still room for Hisilicon to win market share in.

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For example this new large MiniLED TV from Hisense uses Mediatek's MT9653 SoC. Huawei isn't going to win the entire market, but if production comes up more, it can win more of the market and leave less for Mediatek, qcom and others. All of this helps domestic industries
 

usb

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Regarding the EUV machine, does anyone know who is going to build/commercialize it? i sometimes read that huawei, cas or ciomp are building them. Does anyone have an idea? (No one knows would suffice as an answer if nothing is known)
 

tphuang

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Regarding the EUV machine, does anyone know who is going to build/commercialize it? i sometimes read that huawei, cas or ciomp are building them. Does anyone have an idea? (No one knows would suffice as an answer if nothing is known)
Nobody knows and I would suggest that you read through as much of this thread as possible to get a sense of where we are. @tokenanalyst has posted a lot of good stuff
 

AndrewS

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yes, but there isn't much point in doing so I think. The expense of a immersion DUV instrument is in the immersion mechanism and high precision wafer stage, not the light source.

Dry ArF is $20 million. Similar light source. The expense and complexity of EUV is, I believe, hugely in the light source.

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Any guess on what the cost split is for a $150 Mn EUV machine in terms of light source to mirror assembly?
 

measuredingabens

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yes, but there isn't much point in doing so I think. The expense of a immersion DUV instrument is in the immersion mechanism and high precision wafer stage, not the light source.

Dry ArF is $20 million. Similar light source. The expense and complexity of EUV is, I believe, hugely in the light source.

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Is there a cost breakdown somewhere for each system of an EUV machine? I've been trying to google it but it's not something I'm able to find.
 
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