UV-LED may replace UV Lamps in some lithography applications but high power DUV excimers lasers are necesary for high performance frontend lithography patterning.
problem with UV-LED is that it is very hard to generate short wavelengths because photon emission energy is the energy of the direct bandgap.Like some here have talked about, performance of UV-LED light sources has improved enough in recent years that it might make sense to use that as the light source for older nodes. That would be a major disruption to the market if they got it to work. Since UV-LED is a lot more efficient at generating light than an excimer laser or a mercury arc lamp.
The larger the bandgap the higher energy the light emitted, but the larger the bandgap, the more insulating the material is because the room temperature concentration of charge carriers declines exponentially with increasing bandgap.
The worst part is that with bandgap decreases with temperature for semiconductors, so poor efficiency = heat generation = changes the color, making it not monochromatic = poor optical performance.
KrF excimer laser is still lower wavelength (248 nm). The wavelength is temperature independent since excimer dissociation energy is constant, and its monochromatic.