Shanghai Sinyang progress
在集成电路制造用清洗液产品方面,28nm 干法蚀刻后清洗液产品已规模化量产,14nm 技术节点后干法蚀刻后清洗液也已量产并实现销售,公司干法蚀刻后清洗液产品已经实现 14nm 及以上技术节点全覆盖。本报告期干法蚀刻后清洗液产品销售规模不断扩大,广泛应用于逻辑电路、模拟电路、存储器件等晶圆制造客户。其中,铝互连干法蚀刻后清洗液长期受制于国外唯一原材料供应商限制,面对先进制程所需的配套材料亦需国产化的现状,公司自主研发攻关的“卡脖子”的关键原材料项目——非羟胺项目,已开发出满足晶圆制造企业要求的无羟胺干法蚀刻后清洗液产品,并在国内主流晶圆制造客户端通过验证,报告期内该项目产品的清洗能力不断提升
It's 28nm cleaning liquid fter dry etching liquid is already in mass production.
14nm cleaning liquid after dry etching also in mass production
so full coverage of 14nm & above cleaning liquid after dry etching
在光刻胶及研磨液两大类产品方面,报告期内均取得了长足的进展与突破。其中,光刻胶项目研发进展比较顺利,I 线、KrF 光刻胶产品工艺性能指标不断优化,以满足客户的工艺需求,目前已在超 20 家客户端提供样品进行测试验证,报告期内光刻胶销量持续增加,同时原料开发工作也取得阶段性成果, 原料树脂的合成方案探索、工艺优化、稳定性等方面都取得突破。ArF 浸没式光刻胶的研发进展也比较顺利,已在国内多家晶圆制造企业开展测试验证工作,部分型号产品已取得良好的测试结果及工艺窗口,技术指标与对标产品比较接近。报告期内光刻胶系列产品已实现营业收入超百万元。在研磨液系列产品方面,公司的化学机械研磨液(CMP)已有成熟的 STI Slurry、Poly slurry,W slurry 系列产品在超过 10 余家客户端测试验证。本报告期已有多款产品通过客户测试,实现销售,进入批量化生产阶段
in photoresists & polishing product.
I-line and krf photoresists have bene tested by over 20 customers and the sales continue to increase
Arfi photoresists developent going well. Multiple foundries going thru validation work and several type of product has achieved excellent test results and performance is close to standard (looks like almost ready)
they've achieved over 1 million in sales in photoresist
In polishing, they've been validated by 10+ customer for STI/Poly/W slurry products. In mass production
公司布局规划的清洗液、刻蚀液、电镀液及添加剂、光刻胶、研磨液等化学品材料产能不断加强完善,其中上海厂区年产能 1.9 万吨扩充目标已建设完成,合肥第二生产基地一期 1.7 万吨预计四季度投产,二期规划 5.3 万吨年产能相关手续正在办理中
production base continuing to expand. 19kt plant in Shanghai is fully built out. Hefei phase 1 of 17kt is going into production in Q4
a Phase 2 of 53k ton is in application process
this is for photoresist, polishing, etching liquid & cleaning liquid.