Chinese semiconductor industry

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tacoburger

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What is the state of the optical system for the EUV machine, mirrors, lens etc? Is it as good as the state of the art stuff that Carl Zeiss makes? And what company or research institution is making them?
 

tphuang

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This is the detailed spec of StarFive Jh7110 risc-v processor. Apparently it consists of two SiFive CPU cores and one Imagination GPU core,all of which are foreign,plus they are fabricated using TSMC 28nm. That means there is very little if any domestic content in this SOC. This SOC should not be deem as a Chinese domestic chip by any measure
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Looks like they are cooperating with openKylin OS, looks like we are trying to get StarFive CPUs and RISC-V CPUs to work with domestic OS
 

hvpc

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ASML had another good quarter in Q1. Its Q2 guidance is also quite positive.

there were report of more NXT2050/2100 sale for China. I was hoping to see confirmation in the form of larger sales contribution for China. ASML’s Q1 result dis not exhibit this.

we’ll have to wait a few more months to see if ASML does sell more ArFi than previous year in Q2.
 

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Overbom

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Hi. Recently I came across this paper.
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It talks about further enhancing SSMB-EUV (Tsinghua) but I don't really understand the technical details and what enhancements it'spl proposing. Can any EUV expert here explain it in layman's terms please? All forum members will be benefitted from that.
Thanks.
Not an expert either, this seems to be what the paper is proposing:
In this paper, a compact EUV light source that combines the damping ring and the ADM techniques is proposed. A storage ring equipped with SWs is adopted to significantly shorten the dumping time, supporting the generation of high repetition EUV radiation with the ADM technique in a bypass line. The beam is kicked into the bypass beam line for radiation and then re-injected into the storage ring (for reusing) at a much lower repetition rate than the beam evolution frequency in the storage ring. A special design for SWs with quadrupole poles inside is given and studied. The MA of the damping ring is optimized to a large value and a dedicated demodulation lattice in the bypass line is given to ensure a reasonable beam lifetime for high current operation.
Three-dimensional simulations have been performed and the results indicate the generation of kilowatt-level EUV radiation at 13.5 nm with current available technologies.
 

latenlazy

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Hi. Recently I came across this paper.
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It talks about further enhancing SSMB-EUV (Tsinghua) but I don't really understand the technical details and what enhancements it'spl proposing. Can any EUV expert here explain it in layman's terms please? All forum members will be benefitted from that.
Thanks.
The enhancements are just to manage variations in the motion of particles, spacing and alignment of particle bunches, etc being accelerated in the storage ring used to generate the radiation because any variation in those parameters will affect the coherence of the light that gets generated.
 

Awenumick

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Not an expert either, this seems to be what the paper is proposing:
The enhancements are just to manage variations in the motion of particles, spacing and alignment of particle bunches, etc being accelerated in the storage ring used to generate the radiation because any variation in those parameters will affect the coherence of the light that gets generated.
Thanks to both of you.
 

huemens

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China chip event draws Applied Materials, others despite U.S. tensions​

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Applied Materials, Lam Research and KLA are among the main sponsors of the event as is German industrial group Siemens, according to conference materials.
The high-profile sponsorships attest to industry players' eagerness stay connected with China, the world's biggest market for semiconductors and the equipment used to make them.
Losing the Chinese market would not only hurt global earnings, but also cede growth opportunities to Chinese competitors, said an industry executive.
 
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