Oh I was just reading this paper and some others published this and last year this weekend (funny enough before I saw the arguments about SSMB viability here). There’s some potential for very fast development if all these calibration studies pan out in their larger scale device.
Chinese semiconductor industry
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There could always be a fly in the ointment but - knock on wood - everything seems to be going very well. I was skeptical of @WTAN's view that SSMB was in the running for 2025, and once again he's proved right. The optics and workpiece are also progressing very well.
The only question mark seems to be whether the photomasks will be ready in time, but there China has a strong trump card to play. Japan almost entirely monopolizes this industry, but I'll bet a lot of their precursors come from China so there's potential for "offers that can't be refused." If China doesn't get the EUV photomasks, Japan doesn't get the precursors.
Fourier synthesis technology for off-axis illumination in the extreme ultraviolet band.
The team built an experimental setup to verify Fourier synthesis illumination. As shown in Figure 2, it can be seen from the obtained experimental results that relatively good off-axis illumination experimental images have been obtained, and the illumination divergence has also been effectively broadened. The size and spacing of synthetic light sources can also be adjusted in the experiment. In summary, there are relatively few researches on EUV lighting methods for Fourier synthesis technology in China, at least not in public literature. Therefore, the team's progress in EUV lithography lighting is relatively leading in China, which can fill the domestic gap in this technical field and promote the progress of domestic EUV lithography lighting.
Extreme ultraviolet (EUV) light sources such as synchrotron radiation light sources and free electron lasers are widely used in various scientific researches due to their advantages of high power, high stability, cleanliness and pollution-free. However, the high collimation and high spatial coherence of the light source itself make EUV light sources such as synchrotron radiation light sources and free electron lasers unable to be directly applied to lithography process research, such as high-resolution detection of defects on lithography masks. Because the laser with too small divergence angle of the EUV light source cannot obtain a large numerical aperture value, and high spatial coherence will cause speckle effect, thereby reducing the spatial contrast.
Therefore, it is necessary to adopt a lighting technology to solve the problem of high collimation and high spatial coherence of the light source itself, to realize the widening of the inherent divergence angle of the light source itself, and to reduce the high coherence of the light source, which is the task of the lighting system . At the same time, the lighting system also needs to implement different off-axis lighting modes to meet the application of lithography process, such as ring lighting, diode lighting, quadrupole lighting, etc. Based on these requirements, the research group of Wu Xiaobin, a researcher at the Institute of Microelectronics, Chinese Academy of Sciences , has carried out a research on a Fourier synthetic lighting technology to achieve the above application requirements.
Therefore, it is necessary to adopt a lighting technology to solve the problem of high collimation and high spatial coherence of the light source itself, to realize the widening of the inherent divergence angle of the light source itself, and to reduce the high coherence of the light source, which is the task of the lighting system . At the same time, the lighting system also needs to implement different off-axis lighting modes to meet the application of lithography process, such as ring lighting, diode lighting, quadrupole lighting, etc. Based on these requirements, the research group of Wu Xiaobin, a researcher at the Institute of Microelectronics, Chinese Academy of Sciences , has carried out a research on a Fourier synthetic lighting technology to achieve the above application requirements.
The team built an experimental setup to verify Fourier synthesis illumination. As shown in Figure 2, it can be seen from the obtained experimental results that relatively good off-axis illumination experimental images have been obtained, and the illumination divergence has also been effectively broadened. The size and spacing of synthetic light sources can also be adjusted in the experiment. In summary, there are relatively few researches on EUV lighting methods for Fourier synthesis technology in China, at least not in public literature. Therefore, the team's progress in EUV lithography lighting is relatively leading in China, which can fill the domestic gap in this technical field and promote the progress of domestic EUV lithography lighting.
VeriSilicon delivered multi-format hardware video decoder Hantro VC9000D supporting 8K@120FPS VVC/H.266 to customers.
VeriSilicon (688521.SH) today announced its multi-format hardware video decoder Hantro VC9000D is now available to support the decoding of the latest VVC/H.266 (Versatile Video Coding) video compression standard, providing flexible and configurable advanced video decoding solutions for data centers, HDTVs, high-end smartphones and other devices.The newly-launched Hantro VC9000D comes with a multi-format unified architecture, supporting flexible configuration and performance scalability for multiple video formats. Its standalone VVC decoder, or a combination with other decoders for advanced video formats such as HEVC, H.264, AV1, VP9, AVS2, can achieve up to 8K@30fps performance based on 12nm process node, and 8K@60fps or 8K@120fps based on more advanced process nodes or in a multi-core mode. In addition, VC9000D also fully supports comprehensive legacy video formats including VP8, MPEG-4, VC-1, AVS/AVS+, and MPEG-2.
VVC/H.266 is the next generation of the HEVC/H.265 standard and aims to increase video compression rate by 30%-50% without sacrificing subjective video quality. It can provide better video technology support for new video types such as 8K Ultra HD videos, HDR, and 3D panoramic videos, as well as applications including adaptive streaming media and real-time video communication.
“Amid the rapid growth of centralized cloud computing, video as a primary means of communications between cloud and edge display devices, bandwidth optimization and high video quality are the key technology challenges when related applications are deployed, such as video conferencing, virtual cloud desktops, and cloud gaming,” said Wei-Jin Dai, Executive VP and GM of IP Division at VeriSilicon. “VeriSilicon’s Hantro video transcoding solution has been adopted by three out of the top five internet companies in China and 12 of the top 20 cloud service providers worldwide. VeriSilicon is continuously integrating the latest technologies into its Hantro video solution to empower major internet and cloud platform providers. In the future, VeriSilicon will also introduce video technology solutions with higher performance and flexibility leveraging our innovative chiplet architecture, and advanced packaging technologies.”
Wisesoft’s shares surged by the daily trading limit after the Chengdu-based firm said its three-dimensional facial recognition cameras have started using Chinese chips, slashing production costs by more than half.
The 3D cameras with Wisesoft’s new technology perform significantly better than rival foreign products and slash production costs, while there are no obstacles to localizing all components, the firm said late on March 17. The technology is expected to become a major driver of Wisesoft’s rapid growth in the next decade, it added.
Wisesoft completed the development and manufacture of the first 10 engineering prototypes last month, the firm said. The new products exceeded the performance goals set at the start of the project and realized the company’s aim of not using foreign chips, it added.
Widesoft’s products have replaced the Digital Light Processing technology of an overseas company and the Digital Micromirror Device chips it used, the firm said.
In addition to achieving high-precision imaging, the new technology has also greatly accelerated measurement speed, with the prototypes having high-speed measurement of 100 times per second, the firm noted.
The technology is expected to form a more advanced new product -- high-speed high-precision 3D cameras for use in many important sectors -- once the problem of real-time encoding and compression storage of large data streams is solved, Wisesoft added.
Is packaging company specializing in memory packaging and testing.
In 2004, Payton Technology (Shenzhen) Co., Ltd. (hereinafter referred to as Payton Technology) was established in Futian District, Shenzhen. The registered capital is 1.748 billion yuan, and the total investment is 2 billion yuan. Payton Technology has been focusing on high-end memory chip (DRAM, NAND FLASH) packaging and testing services since its establishment. Currently, it is the largest domestic high-end memory packaging and testing domestic enterprise, with dynamic storage particles DDR5, DDR4, DDR3 and LPDDR5, LPDDR4, LPDDR3 And solid-state hard drive SSD packaging test mass production capabilities. The packaging and testing engineering team has more than 17 years of rich experience and technical reserves, and now has packaging solutions and analysis capabilities for various types of products, and can provide diversified testing solution development and optimization services according to customer needs .
I’m not familiar with them, but I know them to be OSAT company
the only domestic DRAM fabs I’m aware of: CXMT, CHJS, Swaysure, and YMTC (planning to enter DRAM space)
the only domestic 3D-NAND fab: YMTC
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YMTC planning to enter the DRAM space is new for me. Do you have a source for this? I'm actually surprised as to these many DRAM fabs being around and only one NAND fab. IIRC NAND is much easier to make as opposed to DRAM so you would expect more companies to make NAND in China as well
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