If they manage to get SSMB to work, it could revolutionize lithography and chip making in general, is not only able to power multiple tools at the same time but is also tunable, that means with some appropriate modifications to the tools it will able to half the wavelength of the light to 6.5nm, not counting that increasing the NA of the projection-objective system , it don't require the per tool hefty hydrogen cleaning systems, the expensive Co2 MOPA laser systems, blue lasers systems, tin molten droplet systems. Per tool will be basically the projection system, vibration cancelling systems, the vacuum system, the mask system, objective system and the maglev dual wafer stage. Technologies that except for the mask system China already have.
Chinese semiconductor industry
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You might be surprised to find that people with particle physics expertise are needed for LPP instruments too. Particle physics isn’t the kind of pie in the sky expertise you seem to think it is. While particle physics is pretty advanced extreme physics, so is plasma physics, and in fact both fields overlap quite a lot (to be clear this is in absolute terms, not relative to global STEM degree holders). And there’s quite a lot of talent globally who have this sort of expertise working in all kinds of industries (to illustrate this point one of my dad’s friends got his PhD in black hole physics but ended up becoming a software developer for flight simulators). Just because a science field is complex though doesn’t mean the equipment that comes out of that expertise is necessarily complex. The complexity in the study of physical dynamics is independent of the complexity of the engineering that goes into the equipment their research creates. You should stop using popular hype as the basis of judgments for how science and engineering topics work.
A low alpha synchrotron is not some super special secret device that needs special secret mastery. China didn’t have one adequate to test their SSMB ideas because China is still building up its stock of scientific equipment and this type of device likely wasn’t high on the list of priorities, not because these devices are hard to build or that there’s no expertise in China to build them. In science research it’s often dumb pointless and wasteful to wait for your own institute or country to build a device you need to test some ideas when another country or institute already built a device that meets your requirements for some other purpose or research path that your institute or country hasn’t gotten to yet. That’s like saying if someone working on stellarator designs for fusion in the US has to go to Germany to use the Wendelstein 7X that means the US is incapable of building a stellarator. This is the value of global science cooperation btw. Just because you *can* do everything yourself doesn’t mean you *should* do everything yourself. If you can go to another institute or country that has the equipment you need, even if you could build the equipment yourself you’re getting better use out of your time and money borrowing someone else’s
And ftr just in case this question has crossed your mind before, academic research equipment is expensive because they are often custom designed and built, and thus don’t benefit from efficiencies you can attain through a rigorous industrial design process and industrial scale.
You are probably not qualified to gauge whether their tests mean “shit”.
China’s early EUV prototype was not meant for industrial use. It was a concept demonstrator for advancing research and development. And has been pointed out already those kinds of plasma based instruments are a different kind of technology from SSMB. The inherent difficulties and faults in one kind of technology don’t automatically apply to another kind of technology just because they’re meant to do the same things. That’s like using difficulties encountered in the development of a fan based hoverboard to set expectations for the development difficulties of a jet pack.
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Not sure about the hydrogen cleaning part being able to be 100% removed. , but they're
While there's no need for Sn removal in a SSMB source, a reduced system is still necessary for the actual exposure chamber because you still need the optics there to be clean. But, the advantage is, its a much simpler system, only for use on the exposure chamber, and not constant, but used only as needed. An intermittent maintenance type machine for use only on the small exposure chamber is much easier than a big system on the light source.
You also don’t need to worry about one extra vapor chemistry factor because you don’t need to deal with vaporized tin drops interacting with other kinds of vapors generated from the high energy physical interactions in your system.Not sure about the hydrogen cleaning part being able to be 100% removed. , but they're
While there's no need for Sn removal in a SSMB source, a reduced system is still necessary for the actual exposure chamber because you still need the optics there to be clean. But, the advantage is, its a much simpler system, only for use on the exposure chamber, and not constant, but used only as needed. An intermittent maintenance type machine for use only on the small exposure chamber is much easier than a big system on the light source.
Just in case people here don’t grasp this, in an LPP light source once you’ve hit that molten tin droplet to get your EUV emissions a lot of that droplet gets vaporized (as in literally turned into vapor, not as in it just vanished from existence) and sprays everywhere inside the light accumulator chamber. You have to have a method to intersect and remove that debris or it will coat the reflective interior of the light accumulator which will reduce the amount of light you can reflect to the optics projection path (and may also hurt the beam scatter profile you ideally want for scanning efficiency). As a result the light source for LPP based machines probably requires more regular maintenance and involve more downtime than their DUV predecessors. LPP is actually a very troublesome technology in a lot of ways.
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Colonel
100m perimeter. I assume it's the circumference.
In that case, the facility is only less than 2/3 the size (area) of an Olympic pool, 33m x 25m. Really quite small and nothing comparable to the size of a Jumbo jet as tacoburger has suggested.
Makes me wonder what the light loss is for an ArFi system and what their at stage light wattage is.
The first in China! Xiamen University achieves 8-inch silicon carbide epitaxial growth
News on March 19, according to the official news from the Department of Physics of Xiamen University, recently, Xiamen University successfully realized the homoepitaxial growth of 8 inches (200 mm) silicon carbide (SiC), becoming the first institution in China to own and realize this technology .
According to reports, as one of the main representatives of the third-generation semiconductors, compared with silicon, silicon carbide has a wider band gap, a higher breakdown electric field, and a higher thermal conductivity. Excellent performance in the frequency domain. Silicon carbide-based power electronic devices have been widely used in aerospace, new energy vehicles, rail transit, photovoltaic power generation, smart grid and other fields.
The current mainstream silicon carbide single crystal and epitaxial growth are still in the 6-inch stage, and expanding the size has become the main path to reduce costs and increase efficiency in the industry chain. However, there are still many technical difficulties in the process of moving towards 8 inches.
The person in charge of the scientific research team of Xiamen University said that by overcoming the problems of greater stress on the 8-inch substrate, easier cracking, and more difficult control of the thickness uniformity of the epitaxial layer, the homoepitaxial growth of silicon carbide based on domestic substrates was successfully realized. The thickness of the epitaxial layer is 12 um, the thickness non-uniformity is 2.3%; the doping concentration is 8.4×10¹⁵ cmˉ³, the doping concentration non-uniformity is <7.5%; the surface defect (Carrot, Triangle, Downfall, Scratch) density is <0.5 cmˉ².
The person in charge of the above-mentioned scientific research team said that this breakthrough marks that my country has mastered the related technology of 8-inch silicon carbide epitaxial growth. The realization of this technology is the result of the industry-university-research cooperation between Xiamen University and Hantiancheng Electronic Technology (Xiamen) Co., Ltd., which will inject new impetus into the development of my country's silicon carbide industry and promote the development of new energy and other related fields.
It is understood that the physics department of Xiamen University was founded in 1923. It is one of the earliest physics courses established in Chinese universities and has played an important role in the history of Chinese physics development. Xiamen University Physics participated in China's first five-university joint semiconductor specialization; developed China's first conductive glass, the first transistor radio, and the first gallium phosphide planar light-emitting diode.
No.
You got just to build a really long conveyor belt.
Didn't Huawei published a patent on that conveyor belt?
Several yi to ten yi.
That is known in America as a ballpark figure.
Chinese is a high context language.
If they say that, then they mean approx 7 to 10 yik.
The fourth generation of semiconductor materials has made another breakthrough! Professor Chen Haifeng's team from the Key Laboratory of New Semiconductor Devices and Materials of Xi'an University of Posts and Telecommunications recently successfully prepared high-quality gallium oxide epitaxial wafers in 8-inch silicon wafers, marking important progress in the research of ultra-wide bandgap semiconductors
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