Never ending sanctions. Not sure they could come up with more bans after this.
But it faced criticism for failing to bring key allies on board with the equipment curbs, since Japanese and Dutch firms, along with U.S. companies, produce chipmaking equipment.
"We expect to have a deal in the near term," Alan Estevez said in a live interview with Washington D.C. based think tank CNAS, when asked what it would take to convince allies, particularly Japan and the Netherlands, to implement similar rules.
So this guy expended months unsuccessfully trying to convince Japan, Holland and other countries to join them, then they decided to go unilateral and rogue causing a lot of damage to companies all over the industry including to their own and their own allies companies, like South Korea that now their companies are begging to get an insignificant 1 year license.
Good luck, because non US companies are salivating for that market share and they are going to fight that, they have a very small window opportunity before Chinese companies take over the entirety of the Chinese market.
TEL has been accelerating their advertising in China about their tools as a one-stop solution for semiconductor manufacturing, just saying.
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I agree China research institutions and the semiconductor industry should put a war-like effort to develop a micro-nano patterning industry, including EUV, DUV, immersion, NIL, Maskless, LED and E-Beam lithography which by the way, is almost no existent in China, not even in the research literature or patent literature, E-beam lithography is essential for advance mask development which is critical for chip making.btw, thanks for the info on Guowang expansion. It seems like they are getting ready for SMEE to mass produce front end scanners of all classes. That's probably the most encouraging news on this.
I think we should not underestimate America's ability to force Japan and Holland to follow its footsteps, but I also it's unlikely to happen in the near term. And I think China should let Japan know of the consequences if it does follow America's order here.
To protect themselves, Chinese companies should definitely fast track their orders for future expansion plans. I think another year of ASML Arfi deliveries would basically be all SMIC/HLMC need. And even if something does get struck up, I think other countries will allow continued servicing and have a grace period. I guess we will see.
btw, thanks for the info on Guowang expansion. It seems like they are getting ready for SMEE to mass produce front end scanners of all classes. That's probably the most encouraging news on this.
What's the deal with electron beam lithography and why isn't China represented? How quickly can China spin up an industry and become competitive?I agree China research institutions and the semiconductor industry should put a war-like effort to develop a micro-nano patterning industry, including EUV, DUV, immersion, NIL, Maskless, LED and E-Beam lithography which by the way, is almost no existent in China, not even in the research literature or patent literature, E-beam lithography is essential for advance mask development which is critical for chip making.
What's the deal with electron beam lithography and why isn't China represented? How quickly can China spin up an industry and become competitive?
There is nascent, vibrant and growing SEM industry in china which is the basis of EBL. Dongfang Jingyuan, pmish-tech and ohters in the semiconductor market, then you have the scientific market with kyky, focus-ebeam and others. But not an serious effort in the lithography market.What's the deal with electron beam lithography and why isn't China represented? How quickly can China spin up an industry and become competitive?
A bit of Chinese history, this is probably one of China first self-made E-Beam lithography system, I think this system date back to 2003 probably in a time that they were having a lot of problems importing this kind systems from Japan, U.S. or Europe. That was until export controls on this kind of systems was relaxed. Who knows how far they would have develop this.
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Electron beam nano-exposure system DY-2000 system overview:
Electron beam nano-exposure system is a special equipment for micro processing, which integrates various high technologies such as light, machine, electricity, vacuum and control.
System composition : electron optical system (scanning electron microscope), pattern generator, precision workpiece table, control system, vacuum system, precision power supply.
main application:
1 : Research on semiconductor devices: microwave transistors, single-electron transistors, quantum dots, superconducting rings, etc.
2 : Research on optoelectronic devices: special gratings, Fresnel zone plates, crystal detectors, optical waveguides, optical integrated devices
3 : Micromechanical research: micro-nano electromechanical systems, micro-channels, micro-sensors, 3D microstructures
4 : Consumer Electronics Research: Holographic Optical Components, Next-Generation DVD Lights, Optical Sensors, Magnetic Heads, Surface Acoustic Wave Devices
5 : Other research: non-production mask fabrication, pattern position calibration and CD measurement
Nano pattern generator DY-2000 is the core component of electron beam nano exposure system DY-2000 , which is independently developed and produced by Institute of Electrical Engineering, Chinese Academy of Sciences. Incorporating the latest achievements of digital signal processing in recent years , the high-performance digital signal processor (DSP) is used to split the unit graphics to be exposed into lines and dots , and then the digital quantity is converted into high-precision through the optimally designed digital-to-analog conversion circuit . The analog quantity of the SEM drives the deflector of the scanning electron microscope to realize the scanning of the electron beam.
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A strong Chinese semiconductor equipment industry means a strong Russian semiconductor industry as Russia has fabless companies but their fabs are constrained by tool supply. Combined with Russian control of Donbass which produces most of the neon in the world, domestic control of titanium and Chinese control of rare earths and tungsten, once the tools are available, a joint Sino-Russian cutoff of raw materials would devastate any semiconductor industry that doesn't play ball.That its, or either he is liar or they gone crazy and they don't know what they doing.
What? So he has gone rogue?
What about the immediate loses.
What about companies who do their products in mature nodes
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What about the damage global reputation of U.S. companies in general because a rogue politician?
What about U.S citizens that will no able to work freely globally?
And those are the immediate unintended consequences, the medium and long term consequences like high prices, lowering the bar for the Republican Party, job losses, reputational damage, companies avoiding using American components,hiring their people , lasting damage to the US semi industry and lasting damage to the global semiconductor industry. .
If these lunatics hate Xi Jinping so much for some reason, guess what? They just prove that Xi was right all this time and now market forces are in his favor.
And to make matters worse, this will likely further damage their much-cherished national security because as Chinese factories become more independent they will become black boxes capable of serving anyone anywhere, including other US adversaries. , no restrictions.
I've been telling everyone that these chicken-hawk politicians are national security lunatics since the beginning of this thread, they grew up watching Cold War spy movies and now they want to live in one. Their ideology clouds their reality.
who knows maybe these guys are so smart that our weak brains can't comprehend their grand policies, but I have my doubts.
E-beam lithography is not so hard if you have ion implantation, electron microscopes or mass spectrometers. After all, the principles of charged beam optics are similar across fields. However the details of implementation such as pattern formation and e-beam active resists are going to be challenging, though there is already e-beam lithography tools in existence. Maybe 1-2 years.What's the deal with electron beam lithography and why isn't China represented? How quickly can China spin up an industry and become competitive?
3/ BIS has “top-down guidance to go after national security threats.” Moreover, “we do not balance national security against [US] trade [losses].” For example, “I do not coordinate export controls w/ my trade counterpart in Commerce.”