You know, I expected it would be the Japanese who would seize the opportunity to supply China while the Euros folded. Turns out ASML is stiff-arming America as hard as it can while Nikon lays like a useless pile. I guess that's why Japan is such a failure - even when it's presented with a golden opportunity on a silver platter, it has no initiative or gumption.
And Japan is known for technology Iteration with incremental improve on their product, like you said ASML act fast cause China will pay premium for those exclusive machine and its a win win, using their expertise from EUVL tech down to DUVL, those R&D will not go to waste as they have a ready and steady customer to sell.
And by the way Nikon near equivalent to ASML NXT 2050i (MMO 1.5, 295 WPH) the NSR-S635E (MMO 2.1 , 275 WPH) is capable of producing 5nm chip and an improve variant the NSR-S636E is schedule to be release in late 2023 to compete with NXT 2100i. It's Nikon last hope as I expect that SMEE will be releasing its improve variant SSA900 22nm DUVL also next year. It will be an exciting year for all Chinese FAB makers as the three will battle it out, selling their advance ware instead of obsolete machine the US envisioned
Nikon Announces Development of the NSR-S636E ArF Immersion Scanner
October 18, 2021
NSR-S636E ArF immersion scanner
TOKYO - Nikon Corporation (Nikon) announced it is currently developing the next-generation NSR-S636E ArF immersion scanner, which will deliver superior overlay accuracy and ultra-high throughput to support manufacturing of the most critical semiconductor devices. Product sales are scheduled to begin in 2023.
As the digital transformation (DX) accelerates, there is an essential need to process and communicate tremendous volumes of data very quickly. High-performance semiconductors are imperative to satisfy these requirements, and semiconductor device technology is progressing with a simultaneous focus on circuit pattern miniaturization as well as 3-dimensional (3D) device structure development.
The NSR-S636E features an enhanced inline Alignment Station, or iAS, which is a wafer pre-measurement module integrated between the coater/developer unit and the lithography scanner. The S636E and iAS utilize sophisticated multi-point alignment measurement and high order correction functions that enable device makers to achieve the stringent overlay accuracy necessary for 3D device structures, while also maximizing immersion scanner productivity. The NSR-S636E is well-suited for cutting-edge semiconductor manufacturing including logic and memory devices, CMOS image sensor applications and more.
Nikon is committed to providing industry-leading lithography solutions like the NSR-S636E immersion scanner that enable customers to advance semiconductor manufacturing and help drive the digital transformation.