@gelgoog bro how much Cymer cost per unit of ASML EUVL, 30%? so lets presume it is then that is a cool $60 million per set. IF a SSMB can power a conservative estimate of 12 units then it is a gamer changer. A SSMB costing $170 million divided by 12 units equals $14 million per unit. The only disadvantage is that you can't export it.The SSMB is just the light source. So you can't assume the cost difference will be like that.
@henrik bro the only American component is CYMER the light source, IF China has introduce its owned EUVL, ASML can use the excuse to sell its NXT 3400C machine powered by Gigaphoton LPP. We have to wait IF that will happen BUT it is ASML only recourse. And for me the Chinese should reciprocate and help ASML source its component locally, a friendly competition is needed to enhance the Chinese IC, with ASML, SMEE, CETC and Nikon battling it out.The yankees will not allow ASML selling EUV to China. So ASML will lose business in China. China will then saturate the market with Chinese EUV machines.
Bro from @WTAN conversation with @ZeEa5KPul, his conservative estimate is 90 lines. While a NXT 3400C is an EUVL set with a 250W CYMER LPP as its light source.If the SSMB can power a hundred EUVL, the production lines will have to spread over a very large area, that means the fabs will have to occupy a big piece of land area? If SSMB can power a hundred EUVL, how many can NXT 3400C power?
The Chart showing the timeline for the construction of the Synchrotron dates back to 2019. Things have changed since then and i believe the whole project has been accelerated with many articles claiming that up to 70% of certain equipment has already been installed.ZeEa5KPul said:
HEPS is scheduled to be completed at the end of 2025; I don't see how it can be used to test SSMB in the near term
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Could you be a little more specific on what's required? The schedule shows some components being installed in 2022, but the earliest commissioning happens in 2023. Furthermore, HEPS is a scientific instrument, it won't be used industrially for EUV lithography. HEPS might certainly be used to validate and test the SSMB phenomenon, and even to develop candidate EUV optics, but it won't be used to make chips. A dedicated synchrotron will have to be built, which I believe is what the Tsinghua project is. I believe that's what we should be keeping our eye on - it seems a much simpler device for the specific EUVL purpose, not a much more complex general-purpose experimental device.
This lends weight to my initial thoughts that SSMB is more for the 2030 timeframe (perhaps a bit earlier, 2027+ if things go well). Near term (around 2024-2025), I believe LPP is a more viable candidate. I believe China will at least have one generation of LPP EUV before it transitions to synchrotron light sources.
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ASML is having supply chain issues. They are shipping EUV units to customers with some parts missing. That means (1) they don't work and (2) they aren't getting paid. When supply catches up they will finish the system at the customer. You can read my analysis here:
The yankees will not allow ASML selling EUV to China. So ASML will lose business in China. China will then saturate the market with Chinese EUV machines.
As long they have the monopoly on EUV tools they will not price themselves out the market, is like big pharma in the U.S. they can charge outrageous prices for their drugs because they have little competition.bro I'm wondering with the restriction impose on China regarding EUVL and only 3 FAB are buying their High NA EUVL, will they price themselves out of the market?
If Tsinghua manage to deliver that SSMB project it could definitely change the IC manufacturing landscape, SSMB is designed so one ring could power multiple litho tools at the same time, instead of having a single light source per tool. If the technology succeed and becomes popular it could hurt Cymer and Gigaphoton, I guess ASML could still sell cheaper tools adapted to this kind of light sources.IF the Chinese delivered their much anticipated EUVL with game changing SSMB will that make ASML High NA EUVL a vanity project?
NA EUV?Each factory will need multiple EUV lithography machines. And the lower the production rate of EUV the more lithography machines you will need to reach the same wafer production.
I hope China doesn't just have an EUV program, but also working on high NA EUV, and whatever is next after that. Only way to beat these competitors is to act like that. Not just continue chasing their tail.