There are some Overseas Chinese here. too.People in China go to Chinese sites. Not to a place like this. Most of the people here are just people outside China who are interested in Chinese technology developments and analysis.
Because they generally get banned fairly quicklyYes there are more than a few of those. Even the odd person in China proper but those are rare as hen's teeth.
Ahhhh, I see.
I remember 10years ago I heard some asml guys talk about something that could be similar to this...was something like the size of a soccer field that could power more than 10 EUV systems. There was concern about environmental impact of something. But I guess they didn't go with this method. I wonder if it's the same as the SSMB technology that you are talking about. Have you heard about this before?
Let me do some research on SSMB to see if I can find anything useful for everyone.
Ok. I went back and read all the posting from the beginning of this year.It was proposed by Stanford in 2015, a breakthrough was archived in 2020 by a team from Tsinghua and a German institute. If you read previous comments we have discussed the idea here.
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I think their had been selling their i-line and their KrF for while, i even had seen some photos of production sites in China were one of the Scanners match their frontend offerings, the problem is because they are not a public company and the owners are the Shanghai electric group, SMEE is pretty obscure about sales of their products. Nobody knows really how much SMEE sell.Ok. I went back and read all the posting from the beginning of this year.
SSMB was indeed investigated by asml, but deemed not economically/environmentally/industrially viable. It was a novel idea that was floated around. My supplier told me it's just not feasible given the timeline of their product release timing. So, my inference is that this is not something that's easy to implement in reality. Sounds good on paper, but hard to industrialize.
Being in the semi industry for almost 30years, my view is not as optimistic as most of you on this forum. I've seen the industry transition from stepper to scanners, from iLine to KrF, to ArF, ArF immersion, and EUV. There is a lot of difficulties going from a concept in a lab to an actual product. Most people are still talking about power source "break through", or even the twin stage...but let me tell you, there's a lot more to it than that. Could SMEE assemble a system to image a wafer and take SEM images? Absolutely. I think delivery of those system today is believable. But to be able to build a system that could withstand the complexity of semiconductor wafer production within the next five years....I have my doubt.
I've evaluated Nikon's system and ASML's system....the hardware are about the same. I would even say the Nikon system's hardware is more robust. But this is not what set ASML apart from Nikon.
Also, I was told SMEE has no system in production, excluding backend applications. Not even their iLine system. So I don't understand how they could jump from having no system in frontend IC manufacturing to having the capability to ship a production worthy 28nm system? Maybe I'm just too conservative, but could someone help me understand why there's so much optimism here for Chinese domestic DUV and even EUV system by 2025? Everyone I talked to in the industry are not so optimistic...even those in China.
IDK if SMEE can but others sub-systems providers could, from my POV looks like SMEE is just acting as a integrator. Like i say before we here is this entire forum not 100% know about anything, here we just scout the surface of an ocean from the beach and that apply to everything. So do not pay to much attention to us we are just enthusiasts.Could SMEE assemble a system to image a wafer and take SEM images?
The fear of U.S. sanctions is fueling the drive of China semiconductor industry. Only time will tell.But to be able to build a system that could withstand the complexity of semiconductor wafer production within the next five years....I have my doubt.
Tbh I think the SSMB concept is still mostly vaporware and will take time to materialize. But the reason why I think 2025 is a doable, albeit difficult, timeline for China to build their own EUV scanner is because they’ve already built a concept EUV scanner at the Changchun Institute of Optics all the way back in 2017, and seems to already have some prototype options for an industrial grade light source, so most of the work they have left to do just to have something usable is component and system integration. In terms of performance I would expect that such an EUV scanner is unlikely to have the same performance and reliability as ASML’s but if you’re SMIC or another Chinese fab it’s not like you’re swimming in alternatives, and some of the business pains from adopting a less reliable or performant scanner can be mitigated somewhat by government support.Ok. I went back and read all the posting from the beginning of this year.
SSMB was indeed investigated by asml, but deemed not economically/environmentally/industrially viable. It was a novel idea that was floated around. My supplier told me it's just not feasible given the timeline of their product release timing. So, my inference is that this is not something that's easy to implement in reality. Sounds good on paper, but hard to industrialize.
Being in the semi industry for almost 30years, my view is not as optimistic as most of you on this forum. I've seen the industry transition from stepper to scanners, from iLine to KrF, to ArF, ArF immersion, and EUV. There is a lot of difficulties going from a concept in a lab to an actual product. Most people are still talking about power source "break through", or even the twin stage...but let me tell you, there's a lot more to it than that. Could SMEE assemble a system to image a wafer and take SEM images? Absolutely. I think delivery of those system today is believable. But to be able to build a system that could withstand the complexity of semiconductor wafer production within the next five years....I have my doubt.
I've evaluated Nikon's system and ASML's system....the hardware are about the same. I would even say the Nikon system's hardware is more robust. But this is not what set ASML apart from Nikon.
Also, I was told SMEE has no system in production, excluding backend applications. Not even their iLine system. So I don't understand how they could jump from having no system in frontend IC manufacturing to having the capability to ship a production worthy 28nm system? Maybe I'm just too conservative, but could someone help me understand why there's so much optimism here for Chinese domestic DUV and even EUV system by 2025? Everyone I talked to in the industry are not so optimistic...even those in China.
@hvpc Shanghai in collaboration with ICRD, From engadget.com from the excerpt below:can anyone help by telling me what city Huawei's 28nm fab is located? are they using all domestic manufacturing systems including SMEE's litho scanner?
We don't know man, they could be hitting gold or could be just vaporware. Maybe the researchers on Tsinghua could be just blind by their ambition. But in times of necessity there is only just one way to find out and money is non an issue by the urgency that China has.Tbh I think the SSMB concept is still mostly vaporware and will take time to materialize. But the reason why I think 2025 is a doable, albeit difficult, timeline for China to build their own EUV scanner is because they’ve already built a concept EUV scanner at the Changchun Institute of Optics all the way back in 2017, and seems to already have some prototype options for an industrial grade light source, so most of the work they have left to do just to have something usable is component and system integration. In terms of performance I would expect that such an EUV scanner is unlikely to have the same performance and reliability as ASML’s but if you’re SMIC or another Chinese fab it’s not like you’re swimming in alternatives, and some of the business pains from adopting a less reliable or performant scanner can be mitigated somewhat by government support.