Thanks for your detailed explanation.I think their had been selling their i-line and their KrF for while, i even had seen some photos of production sites in China were one of the Scanners match their frontend offerings, the problem is because they are not a public company and the owners are the Shanghai electric group, SMEE is pretty obscure about sales of their products. Nobody knows really how much SMEE sell.
There have been announcement and rumors over the immersion scanner since early 2020, doing my research, i think they are developing an immersion system from a while back and the development had REALLY accelerated after the sanctions, some companies have been set for this project to mass produce subsystems and parts not only for the immersion scanner but also for the other systems they have. I Think SMEE planning to do an upgrade to all their systems, the SSB520 was an upgrade from the SSB500 with better resolution and accuracy. Others may follow.
The EUV issue just my conviction that they are putting an herculean effort to develop an EUV scanner, there has been a big output of immersion lithography patents in 2020-2021 by the lithography companies in China but not papers by research institutes, now they are just publishing EUV papers like the ones i posted before, so i just guessing that they could have a prototype by 2025. But even that could put a lot of pressure to ASML to ship their low NA EUV to China, who have fought hard to secure the Chinese market.
I think Export controls are usually adjusted depending potential of China of developing something, if not the best Scanner that China would have been allow to import would be a KrF scanner.
View attachment 85357
I am not 100% sure about anything in life but that is just how i view the situation. So don't pay to much attention to us we are just a group of enthusiasts.
BTW, at one point in time ASML was thinking about working with SMEE, where ASML will focus on high-end systems and will license their know-how to SMEE to build the low-end systems. That never materialized. Picture you shared was to kick-off their collaboration. But like I said, it didn't go any where beyond this kick-off meeting.
As for SMEE's current product offering. They are able to build and capture market share for iLine and some Krf for the backend packaging application. In this space, the imaging requirement and placement accuracy are not so critical. This is not a space that ASML plays in. ASML's systems, even the iLine are all scanners (not steppers) and are used for front-end wafer manufacturing which has much much tighter imaging and placement accuracy.
SMEE does claim they have FEOL systems...the 600s. They had shipped a couple of them before but where all returned to them (not put into production). My ex-colleague that's in SMEE told me they will attempt again to place these low end systems into FEOL application this year. I think SMEE's FEOL iLine system will be shipped to SMIC, HuaHong (Grace + HLMC), CXMT, & YMTC...expectation there is these will be used, at least, for the most low-end iLine step in FEOL. I think this system's adoption this year for volume production is solid and will definitely happen.
As for the immersion system...my contacts in the industry in china are not so positive. We all believe, SMEE will be able to integrate all the parts together to produce systems that can image a wafer, but probably not good enough for production. I heard from second hand information that even SMEE don't think their system could work for production this year. Anyhow, this is just what i heard from talking to people that are work closely on litho R&D and production. From what I see, most of the hype is from the netizens...even SMEE are quite silent on this.
I for one, hope the likes of SMIC works on growing higher margin mature processes. Investing in high-end nodes are very costly. I'm biased because I want SMIC to make money so I can reap profit from my SMIC stocks.