So if say they developed the EUV light source tomorrow, how will this light source goes to the EUV?Tsinghua is academia. They do not generally focus on direct commercialization. That is the focus of industry laboratories.
Extreme Ultraviolet Photoresist Inspection Platform in Shanghai Synchrotron Radiation Facility
ZHAO Jun1,2, YANG Shu-Min2, XUE Chao-Fan2, WU Yan-Qing2*, CHEN Yi-Fang1, TAI Ren-Zhong2
Abstract: As the next generation of lithography technology, extreme ultraviolet lithography has been given the mission of saving Moore′s law by the industry. Extreme ultraviolet photoresist is one of the core sub-technologies of extreme ultraviolet lithography. The inspection of its resolution, roughness, sensitivity and outgassing conditions is a necessary condition for the development of extreme ultraviolet photoresist and it is also an important part to optimize the resist performance. Extreme ultraviolet interference lithography based on synchrotron radiation is currently the most suitable method for testing the performance of extreme ultraviolet photoresist. According to related research and development needs, an extreme ultraviolet photoresist inspection platform based on this method has been established in Shanghai Synchrotron Radiation Facility(SSRF). By continuously improving the stability of the device, developing independent beam splitting grating mask manufacturing technology, and constantly exploring and optimizing the corresponding interference exposure process, the current inspection resolution has reached below 20 nm, which basically meets the corresponding requirements for the 7 nm process node of extreme ultraviolet lithography.
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They create spinoff companies.Tsinghua is academia. They do not generally focus on direct commercialization. That is the focus of industry laboratories.
They have like most Chinese or any Universities teach transfers mechanisms.So if say they developed the EUV light source tomorrow, how will this light source goes to the EUV?
18% growth in IC sales sounds impressive, but it's disappointing when considering that global IC market grew 26% last year:Thanks to the US, investment in domestic chip sector enjoys another year of exponential growth.
Nice! So these tested photoresists are already very good! Is there a rule of thumb to convert between "advertised" node size and the actual minimum physical size of a feature?
Also, given the heavy funding going into Chinese semiconductor fabrication and its various inputs, we might get into the rather insane situation where Chinese companies are selling photoresists to TSMC and Samsung before SMIC EUV lithography is up and running.
i put it more like 2025 for the first working machine. I think SMEE already shipped their their immersion lithography scanner to SMIC and YTMC for testing and verification but the mass production of parts for the machine still is going on and because EUV optics is different, my guess that they are going to put more effort in immersion and dry lithography for now. i think most SMEE scanners and steppers are going to receive an upgrade. the hint is that SSB500 is now the SSB520.It is a matter of time now, sooner or later, a fully domestic EUV inside China.
This is the test, maybe a prototype.
2024 sounds about right when they probably have the real thing, for production.
If they did this, then that should mean the lens is ready too, if there is a lens, lol, I don't know. Getting the chemicals here right is an important step. They already got the precision work bench.
Once they have all the working parts tested and functional, then build the plant.
That will be some crazy ass fab they are going to build. It would like two separate buildings maybe, with a conveyor belt of several kilometers! I would like to see something like that built!
Haha!
i put it more like 2025 for the first working machine. I think SMEE already shipped their their immersion lithography scanner to SMIC and YTMC for testing and verification but the mass production of parts for the machine still is going on and because EUV optics is different, my guess that they are going to put more effort in immersion and dry lithography for now. i think most SMEE scanners and steppers are going to receive an upgrade. the hint is that SSB500 is now the SSB520.