(cont)
a while.
The left picture is a schematic diagram of the double-beam overlap processing technology; the right picture is an electron microscope picture of a 5nm slit electrode
Similarly, in Optics Valley, China, the relevant team of Wuhan Optoelectronics National Research Center issued a patent as early as 2018 [ 4 ] , proposing a dual-beam micro-nano optics manufacturing method, which modulates auxiliary light and matches self-developed photoresist to make visible light The manufacturing achieves a feature size of 10 nm or less and a resolution of 50 nm.
Device diagram of dual-beam optical micro-nano manufacturing method applied to single-focus laser direct writing
At present, the technology is being industrialized relying on Wuhan Optoelectronics Industrial Research Institute. Based on the dual-beam super-resolution nanolithography technology, the team has achieved high-precision direct writing lithography with a minimum line width of 9nm and a minimum line spacing of 52nm, and a 9nm dual-beam super-resolution The direct-write lithography machine has achieved commercial sales. The dual-beam super-resolution projection lithography experimental prototype was also tested in 2019, and the research and development of large-scale engineering prototypes is being carried out to rapidly promote the industrialization process.
"Through upstream mergers and acquisitions and introducing customers as shareholders to open up the upstream and downstream of the industry and create a community of interests in the industry chain, ASML has grown from obscurity to the overlord of lithography machines. We also invite all parties to carry out technical cooperation with an open mind, hoping to go out A different route to localization of light sources."
With the continuous development of technologies such as the Internet of Things and 5G, semiconductor demand will continue to grow in the future. According to IBS data, in 2018, Chinese IC design companies demand about 80.5 billion yuan in wafer manufacturing, accounting for 19.7% of the global foundry scale of 408 million yuan, and the demand will rise to 30.5% in 2025.
Relevant research institutions believe that under such a pattern, it is imperative to realize the localization of lithography machines. At present, there is a big gap between the domestic and foreign top lithography mechanisms, and the national system cannot break through the EUV route diffraction limit in a short time. Under this background, the development of the super-resolution technology route based on dual-beam technology may be a bright spot. Domestic substitution of engraving machines brings dawn.
references
[1] Yang Ji. Extreme ultraviolet radiation source device: China, 110837208 [P]. 2020-02-25.
[2] Zhang Zongxin. LPP-EUV light source system based on plasma confinement: China, 111399346 [P]. 2020-07-10.
[3] Liang Qin, Yuanqing Huang, Feng Xia. Nano Letters 2020, 20, 7, 4916-4923.
[4] Gan Zongsong. A manufacturing method of dual-beam micro-nano optics: China, 1083279550 [P]. 2018-07-13.