Innovative product matrix leads to technological breakthroughs The content of Huahai Qingke's exhibition has attracted much attention from all walks of life. At the opening, consultants came in droves, the exhibition area was crowded with people, the atmosphere was warm, and everyone actively exchanged and discussed. The new products made a grand appearance and quickly became the focus of the audience, arousing in-depth discussions and gaining wide praise.
Universal-H300 The 12-inch CMP equipment adopts an innovative polishing system architecture and integrates advanced polishing technology, high efficiency and high stability.
Third-generation and a half CMP equipment Universal-TGS200 Equipped with three sets of polishing modules with innovative polishing system architecture and integrated back-end cleaning technology, it is a highly automated and efficient dedicated CMP equipment designed for third-generation semiconductor materials (SiC).
Large beam ion implanter IPUMA-LE It uses advanced beam climbing technology, integrates magnetic field and electric field modules, and is equipped with precise measurement technology. It is a large-beam ion implanter with excellent ion screening capabilities and accuracy.
Thin film polishing machine Versatile-GP300 The innovative layout of the new machine integrates advanced ultra-precision grinding, CMP and post-cleaning processes to meet the needs of ultra-precision wafer thinning technology in 3D IC manufacturing, advanced packaging and other fields.
Edge trimmer Versatile-DT300 The high-efficiency, high-cleanliness fully automatic dual-axis wafer edge trimming equipment can accurately solve the edge collapse problem during wafer thinning and improve the thinning quality. It can meet the technical requirements of manufacturing processes such as memory chips, image sensors, and advanced packaging.
Edge polishing machine Master-BN300 It integrates high-precision polishing, efficient cleaning and precise measurement functions to significantly improve the smoothness of the wafer edge, meet the technical requirements of high-precision edge processing in the semiconductor manufacturing field, and meet the technical requirements of key processes such as memory chips and advanced packaging.
Brush cleaning machine HSC-S3810 Equipped with an excellent parameter closed-loop control system, it has front, back and edge cleaning functions, and the advanced atomization cleaning technology can achieve damage-free cleaning.