AMEC releases Primo Halona™, the first wafer edge etching tool, further improving the coverage of key etching processes
During the SEMICON China 2025 exhibition, Shanghai Advanced Micro-Electronics Equipment Co., Ltd. (hereinafter referred to as "AMEC", stock code "688012.SH") announced the official release of its independently developed 12-inch wafer edge etching equipment Primo Halona™. The advent of this etching equipment by AMEC has achieved another breakthrough innovation in the field of plasma etching technology, marking the company's further progress towards the goal of comprehensive coverage of key processes, and also injecting strong momentum into the company's high-quality development.
This 12-inch edge etching equipment Primo Halona™ adopts the dual-reactor design with the characteristics of AMEC, which can flexibly configure up to three dual-reactor reaction chambers, and each reaction chamber can process two wafers at the same time, while ensuring low production costs, meeting the mass production needs of wafer edge etching, thereby achieving higher output density and improving production efficiency. In addition, the equipment chambers are equipped with Quadra-arm robotic arms, which are precise and flexible. The interior of the chamber is designed with corrosion-resistant materials to resist halogen gas corrosion, providing guarantees for the stability and durability of the equipment. In addition, Primo Halona™ is equipped with a unique self-alignment installation design, which can not only improve the centering accuracy and parallelism of the upper and lower plates, but also effectively reduce the downtime maintenance time caused by calibration installation, thereby helping customers optimize production capacity and lean production. In terms of equipment intelligence, Primo Halona™ provides an optional integrated measurement module. Customers can use this measurement template to achieve local real-time film thickness measurement, one-click compensation calibration of wafer transfer, and achieve better product maintainability, greatly improving the efficiency of later maintenance.