Chinese semiconductor thread II

AndrewS

Brigadier
Registered Member
lol, Taylor literally said the plant for it is operational right now. What is wrong with you?

I would expect a plant to be already operational, but with an existing DUV lithography process that has been debugged as much as possible, because they'll have enough new problems with a new EUV machine.

If you believe what he said, then it is already being tested or getting close to start testing.

If you take what he says seriously, then your conclusion is bad. If you don't take what he says seriously, then why are you posting it?

I'll be pleasantly surprised if they debug and then start scaling in 2 years, but my guess is that it'll take a bit longer.
 

antiterror13

Brigadier
I would expect a plant to be already operational, but with an existing DUV lithography process that has been debugged as much as possible, because they'll have enough new problems with a new EUV machine.



I'll be pleasantly surprised if they debug and then start scaling in 2 years, but my guess is that it'll take a bit longer.

The potential issues of your assumptions are that you assume that EUV development is after DUVi ... China is in over drive developing at the same time, even there are 2-3 institutions independently developing EUV for years

If China is only able to make EUV prototype in 4 years time, I think that really bad very bad ... I don't think that the case though
 

OptimusLion

Junior Member
Registered Member
USTC uses silicon-based gallium nitride to achieve efficient and stable artificial photosynthesis for hydrogen production


The iGaN Laboratory of Professor Sun Haiding of the School of Microelectronics at the University of Science and Technology of China, in collaboration with the team of Professor Xiong Yujie of the Hefei National Research Center for Microscale Physical Sciences and the team of Academician Liu Sheng of Wuhan University, has made important progress in the field of photoelectrochemical hydrogen production. The research team has achieved a half-cell solar hydrogen production efficiency of up to 10.36% by innovatively designing a new silicon-based gallium nitride nanowire photoelectrode structure that can be manufactured at the wafer level, and has stably produced hydrogen for more than 800 hours at high current density (for the first time, the photoelectrode life has been pushed from the "hourly level" of less than 100 hours to the "monthly level"), successfully breaking through the bottleneck of efficiency and reliability of traditional photoelectrochemical hydrogen production devices, reaching the international leading level, and laying the foundation for the next step of large-scale hydrogen production applications. The results were published in the international academic journal Nature Communications under the title "Enhanced solar hydrogen production via reconfigured semi-polar facet/cocatalyst heterointerfaces in GaN/Si photocathodes".

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OptimusLion

Junior Member
Registered Member
Xuantie's first server-level RISC-V processor C930 will be delivered next month

On February 28, the reporter learned from the 2025 Xuantie RISC-V Ecological Conference held by the DAMO Academy that Xuantie's highest-performance processor C930 will start delivery in March. The general computing power performance of C930 reaches 15/GHz in the SPECint2006 benchmark test, and is aimed at server-level high-performance application scenarios. At the same time, C930 is equipped with 512 bits RVV1.0 and 8 TOPS Matrix dual engines, which natively combines general high-performance computing power with AI computing power, and opens the DSA expansion interface to support more feature requirements

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sdkan

New Member
Registered Member
Interesting tidbit on Huawei (presumably lithography related) from the Manifold Podcast below

youtube.com/watch?v=fmjR3me5s_Q&list=PLDtK-oqJj1JeUEAbyG-aIXrYdxpB5mI7E

---

"Huawei (unlike most other Chinese companies) are treating US technology sanctions like a wartime situation"
"Huawei has 2 "breakthrough" teams, voluntarily working non-stop 24/7"

---

So my personal revised guess is that now, we'll see a Chinese EUV lithography machine in less than 4 years.

we'll see a Chinese EUV lithography machine in less than 1 year
 
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OptimusLion

Junior Member
Registered Member
50-megapixel products are in mass production, GalaxyCore's net profit in 2024 increased by 287.24% year-on-year


The 2024 performance report was released, stating that during the reporting period, GalaxyCore achieved operating income of 638,933.26 million yuan, a year-on-year increase of 36.02%; net profit attributable to the parent company's owners was 18,682.43 million yuan, a year-on-year increase of 287.24%; net profit attributable to the parent company's owners after deducting non-recurring gains and losses was 7,067.49 million yuan, a year-on-year increase of 14.57%; basic earnings per share was 0.07 yuan, a year-on-year increase of 250%.


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antiterror13

Brigadier
we'll see a Chinese EUV lithography machine in less than 1 year

Can you please elaborate a bit, thanks ? I think in 2 years, the question is whether first Chinese EUV would be more advanced than the first ASML EUV? ... I believe would be more advanced, but I don't think would be as advanced as the latest ASML EUV
 

measuredingabens

Junior Member
Registered Member
Can you please elaborate a bit, thanks ? I think in 2 years, the question is whether first Chinese EUV would be more advanced than the first ASML EUV? ... I believe would be more advanced, but I don't think would be as advanced as the latest ASML EUV
Probably on par or at the very least directly comparable to ASML's latest low-NA EUV. High-NA machines are large enough that fabs might need to specifically be built with them in mind.
 

OptimusLion

Junior Member
Registered Member
The FTS near-infrared spectrometer developed by the School of Microelectronics of BIT won the Top Ten Scientific and Technological Innovation Achievements of Western (Chongqing) Science City in 2024!


This achievement uses MEMS electrothermal micromirror technology to successfully avoid dependence on motors, and uses independently developed and produced MEMS micromirrors to break the technical bottleneck of core components of domestic spectrometers, solve system problems such as micromirror thermal response time, modulation accuracy, and drive control, fill the domestic technology gap, and reach a world-leading position

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