Chinese equipment makers normally use 28nm as a way to avoid attention, so probably they could go as low a 14nm or less. Overlay is not a function exclusive of the scanner, metrology plays a big role. The alignment is exclusive of the scanner but overlay looks like is a process in optical lithography, long story short is interesting that SMEE listed the
Diffraction Based Overlay tool for 7nm, why not 28nm? That for me is that they are saying an discrete way that their scanners can produce chips in that process node, 7nm.
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