Chinese semiconductor thread II

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tokenanalyst

Brigadier
Registered Member

Allocation method of micromirror array for deep ultraviolet illumination system​


Abstract​

Source and mask optimization (SMO) is a crucial resolution enhancement technique for 28nm technology node and beyond in lithography. The allocation method of micromirror array (MMA) is the key to produce the freeform illumination source. The generated illumination source is affected by the computation speed and accuracy of the allocation method. In this paper, an allocation method of micromirror array for deep ultraviolet illumination system is proposed. The computation speed of the proposed method is faster than the traditional method. The experimental results show that the computation efficiency of the proposed method has been improved by at least 50%.​

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E

european_guy

Junior Member
Registered Member
antwerpery said:
If that's true, why post rumors of it on twitter?
Click to expand...


Q "Something weird about a TSMC employee publicly saying that the technology from one of their key partners is “cooked” without any evidence. TSMC is the most disciplined firm in the world. This doesn’t fit that profile."
A: "we are a forward looking company, we don't get stuck with norms, this is why tsmc is #1"
Click to expand...

This is highly suspicious, I cannot believe this, sorry.

A TSMC employee cannot reveal in such a superficial and arrogant way such insider information that, if true, could collapse ASML shares to -30% in less then one hour!
 
sunnymaxi

sunnymaxi

Major
Registered Member
european_guy said:
This is highly suspicious, I cannot believe this, sorry.

A TSMC employee cannot reveal in such a superficial and arrogant way such insider information that, if true, could collapse ASML shares to -30% in less then one hour!
Click to expand...
even if true. it will still take years upon years to reach commercialization level. so most probably after 2030 if early. even after that EUV/DUV will continue to play crucial role.

X-ray lithography, electron beam lithography, focused ion beam lithography, and nanoimprint lithography are next generation Lithography techs.

Japan is there and China is also aggressively working on NIL/E-Beam Litho.
 
N

Naladona

Just Hatched
Registered Member
《Numemory Releases Upgraded Higher Capacity Memory 》

“On January 22nd, 2025, the company announced the launch of its latest masterpiece, the new non-volatile memory “NM102”. This new product not only reaches a staggering 128Gb capacity on a single chip, but also achieves a major breakthrough in performance, supporting 4K high-speed access， The read bandwidth is up to 3.2GB/s, setting a new benchmark in the industry.”
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The “NM102” (128Gb) doubles of the “NM101” (64Gb), which was released in September 2024.It's phase change memory, like the intel optane.
 
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