the "2025 Semiconductor Investment Annual Conference and IC Billboard Awards Ceremony" hosted by the Semiconductor Investment Alliance and organized by Aijiwei was successfully held in Shanghai. At the scene, Dongfang Jingyuan Microelectronics Technology (Beijing) Co., Ltd. (hereinafter referred to as "Dongfang Jingyuan") won the "Annual Leading Enterprise Award" of this year's IC Billboard.
The award aims to commend leading companies in the industry with outstanding leadership and strong appeal, helping companies to further enhance their market influence, attract more attention and resources, and thus continue to lead industry development and promote product and business innovation.
Relying on a strong team of talents, Dongfang Jingyuan has accumulated a number of patents and core technologies in R&D and
innovation. So far, it has applied for more than 600 patents, authorized more than 150 patents, registered 25 software copyrights, and registered more than 100 trademarks. It is reported that Dongfang Jingyuan has established good cooperative relations with many leading integrated circuit manufacturing companies in China ( serving 40+ top customers, covering domestic leading wafer foundry companies in multiple fields such as logic, storage, and third-generation semiconductors ).
As we all know, electron beam measurement and testing equipment is one of the most technically difficult equipment categories in chip manufacturing equipment besides lithography machines. A
s one of the earliest companies in China to enter this field, Dongfang Jingyuan quickly launched electron beam defect detection equipment EBI, key dimension measurement equipment CD-SEM (12 inches and 6 & 8 inches), and electron beam defect re-inspection equipment DR-SEM, firmly occupying the three major sub-segments of electron beam measurement and testing, and leading in product diversification and product maturity. After continuous iterative research and development, product performance indicators have been further improved, leading the rapid development of the domestic electron beam measurement and testing industry.

As a pioneer and leader in domestic computational lithography technology, Or
iental Jingyuan's PanGen® computational lithography series products are solving the "bottleneck" problem in computational lithography in China's integrated circuit field. It is also the world's first full-chip reverse lithography mask (ILT) optimization engineering software. At present, its PanGen® platform has formed 8 product matrices, including - precise process simulation, DRC, SBAR, OPC, LRC, DPT, SMO, DMC, and has a complete computational lithography-related EDA tool chain. In addition, Oriental Jingyuan has continuously consolidated the comprehensiveness and expansibility of technology in the field of computational lithography through deep technical cultivation. PanGen ILT® has been innovated again this year, and the new product PanGen DMC® has been launched and verified. In response to the needs of domestic cutting-edge customers, the platform has also updated and iterated the latest PanGen® 5.0 version.
In the "Computational Lithography 3.0 Era", Dongfang Jingyuan will become one of the key supporting technologies for the independent control and self-reliance of my country's semiconductor industry chain, bringing more advanced and forward-looking computational lithography solutions to the industry. On this basis, Dongfang Jingyuan also fully utilized its advantages in computational lithography software OPC and electron beam measurement and testing equipment. After more than two years of iterative upgrades, YieldBook 3.0 version was launched online, becoming the industry's first one-stop yield management software for measurement data (MMS), defect data (DMS), and yield data (YMS), further consolidating its strength and capabilities in the field of yield management.
Looking through the "report card", Dongfang Jingyuan has accumulated enough confidence - it has undertaken three national science and technology 02 major projects, one industrial base strengthening project of the Ministry of Industry and Information Technology, and three key research projects of a certain national ministry, and has joined the ranks of the "national team" of integrated circuits; in addition, it has successively won many honors such as "National Specialized and New 'Little Giant' Enterprise", "National High-tech Enterprise", and "Postdoctoral Work Station".