Chinese semiconductor thread II
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China optical design software got an upgrade.
The software has made progress in high-precision ray tracing research
The Optical Intelligent Computing Research Team of the Key Laboratory of Space-Based Integrated Information Systems, Institute of Software, Chinese Academy of Sciences , published a research paper titled Mathematical modeling for high precision ray tracing in optical design in Applied Mathematical Modelling . . This study proposed a novel formalized ray tracing error model, and based on the guidance of the error model, a high-precision ray tracing algorithm was proposed.
Ray tracing is the basis of optical design, and its calculation errors have a great impact on the accuracy of optical design. Small disturbances can cause significant degradation of image quality. The influencing factors and mechanism of floating-point calculation errors in ray tracing have always been unsolved problems in the field of optical design. In order to solve the above challenges, this research provides a set of standard formulas for ray tracing, and based on the floating point calculation theory, derives the ray tracing error model, and theoretically infers the composition of the ray tracing error, the upper and lower bounds of the error, and the error expression . At the same time, based on the ray tracing error model, researchers proposed five major measures to improve ray tracing accuracy, namely virtual section, reprojection, vicious cancellation avoidance, unitization and coordinate localization.
The algorithm proposed in this study has been integrated into the optical design software SeeOD and compared with the ray tracing algorithms of the optical design software Zemax and CODE V. The results show that this algorithm has better numerical stability and tracking accuracy for both meridional rays and spatial rays. The average residual of the ray tracing intersection is 4 and 6 orders of magnitude smaller than Zemax and CODE V respectively. The average residual of the light direction vector is The difference is 5 and 8 orders of magnitude smaller than Zemax and CODE V respectively.
Right. SMEE was originally meant to just do a minor upgrade of their 90 nm dry ArF lithography machine. To improve overlay and thus increase resolution from 90 nm to 65 nm. But this seems to have been cancelled in favor of their new machine series. Which has had several changes made to its specifications in the process of development. They added immersion lithography, dual wafer stage to compete with ASML DUV machines, and they boosted the power of the excimer laser several times to improve throughput. Of course this must have delayed production quite a lot.
The story of the WS-15.
Also notable here that this camera uses sCMOS sensor from Gpixel which is a CIOMP spinoff. OV is the most capable domestic company in consumer grade cmos, while Gpixel is the most competent for high end specialized fields.
Tsinghua University applies for patent for photolithography machine grating measurement and calibration system
According to the announcement from the State Intellectual Property Office, Tsinghua University applied for a project called "A grating measurement and calibration system for lithography machines", with the public number CN117367746A, and the application date is September 2023.
The patent abstract shows that the present invention provides a photolithography machine grating measurement and calibration system, which relates to the technical field of grating measurement and includes a frame, a motion system with independent motion directions, a planar grating assembly, a grating reading head assembly, and a laser interferometer assembly. Following motion system, vacuum bellows assembly and reflector assembly, the vacuum bellows is installed on the following motion system and is located between the corresponding laser interferometer and the reflector, the following system is fixed on the frame and follows The motion system moves; the grating reading head assembly and the plane grating assembly are respectively fixed in the X direction and Y direction of the motion system. The grating reading head and the plane grating cooperate with each other and provide real-time feedback on the X- and Y-direction linear displacements of the calibrated part as well as the rotation angles around the X-, Y-, and Z-axes respectively, and compare the calibrated parts measured by the grating reading head and the laser interferometer. Calibration can be completed by linear displacement and rotation angle of (mirror assembly and plane grating assembly).
The patent abstract shows that the present invention provides a photolithography machine grating measurement and calibration system, which relates to the technical field of grating measurement and includes a frame, a motion system with independent motion directions, a planar grating assembly, a grating reading head assembly, and a laser interferometer assembly. Following motion system, vacuum bellows assembly and reflector assembly, the vacuum bellows is installed on the following motion system and is located between the corresponding laser interferometer and the reflector, the following system is fixed on the frame and follows The motion system moves; the grating reading head assembly and the plane grating assembly are respectively fixed in the X direction and Y direction of the motion system. The grating reading head and the plane grating cooperate with each other and provide real-time feedback on the X- and Y-direction linear displacements of the calibrated part as well as the rotation angles around the X-, Y-, and Z-axes respectively, and compare the calibrated parts measured by the grating reading head and the laser interferometer. Calibration can be completed by linear displacement and rotation angle of (mirror assembly and plane grating assembly).
Chinese semiconductor industry
North Huachuang N7 project is about to fully complete the structural topping According to news from Weibo, Beijing Yizhuang, NAURA's N7 project is expected to fully complete the structural topping on December 25. The project officially started in April this year , and the underground structure...
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