Chinese semiconductor thread II
- Thread starter vincent
- Start date
It is already dropped to 0% for lithography machines, when they published October 2023 rules.
I would concentrate less on what he is proposing and more on what he has stated as things that he found from researching.
After all, the only thing matters is not what he is proposing, but what the US govt puts into law.
After all, the only thing matters is not what he is proposing, but what the US govt puts into law.
I'm talking about equipment supplied by TEL
I would said only MultiBeam Mask Writers and EUV lithography scanners. There is strong evidence that they already have EUV mask inspections tools, in the patent literature and because China is already testing EUV masks.
(Reuters) - A bipartisan group of U.S. lawmakers on Monday urged the Department of Commerce to examine national security threats from China's development of silicon photonics technology, a fast-developing field that could speed up artificial intelligence.
Huafeng Measurement & Control's Q3 net profit increased by 181.16% year-on-year
Huafeng Testing & Control released its third quarter report for 2024, stating that the company's operating income during the reporting period was 242,125,327.92 yuan, a year-on-year increase of 76.42%; the net profit attributable to shareholders of the listed company was 100,603,501.52 yuan, a year-on-year increase of 181.16%; the net profit attributable to shareholders of the listed company after deducting non-recurring gains and losses was 96,241,784.36 yuan, a year-on-year increase of 161.48%.
Huafeng Testing & Control's operating income in the first three quarters was 621,198,629.1 yuan, a year-on-year increase of 19.75%; the net profit attributable to shareholders of the listed company was 213,093,657.21 yuan, a year-on-year increase of 8.14%; the net profit attributable to shareholders of the listed company after deducting non-recurring gains and losses was 223,251,022.85 yuan, a year-on-year increase of 15.72%.
Huafeng Testing & Control stated that the increase in market demand led to an increase in operating income and net profit in the third quarter, and the earnings per share indicator changed with changes in net profit.
Huafeng Testing & Control's operating income in the first three quarters was 621,198,629.1 yuan, a year-on-year increase of 19.75%; the net profit attributable to shareholders of the listed company was 213,093,657.21 yuan, a year-on-year increase of 8.14%; the net profit attributable to shareholders of the listed company after deducting non-recurring gains and losses was 223,251,022.85 yuan, a year-on-year increase of 15.72%.
Huafeng Testing & Control stated that the increase in market demand led to an increase in operating income and net profit in the third quarter, and the earnings per share indicator changed with changes in net profit.
Qingdao Pingxin CMP polishing material R&D and production base project put into production.
The project is invested by Shanghai Runping Electronic Materials Co., Ltd., with an investment of 100 million yuan. It mainly builds a research and development production base project for CMP polishing materials and precision polishing head assembly for semiconductor chip manufacturing, providing an overall solution for CMP materials and components, and providing CMP polishing materials and precision polishing head assembly services for chip manufacturing for chain-leading enterprises nearby, ensuring the security of the industrial chain and supply chain, and effectively promoting the development of integrated circuit enterprises. At the same time, it fills the gap in the field of CMP polishing materials and precision polishing heads in Qingdao's integrated circuit industry, and plays an important supporting role in the development of Qingdao's integrated circuit industry chain. After the project reaches full production, the annual operating income is expected to reach 300 million yuan, and the annual tax revenue is about 11.35 million yuan.
SMIC applies for patents related to focus monitoring of lithography machines, enabling online focus monitoring with minimal impact on product wafer graphics
Information from the National Intellectual Property Administration shows that Semiconductor Manufacturing International Corporation (Shanghai) has applied for a patent titled "Photolithography machine focus monitoring method, focus monitoring mask and formation method thereof", publication number CN 118818885 A, and application date April 2023.
The patent abstract shows a focus monitoring method for a lithography machine, a focus monitoring mask and a method for forming the same, wherein the focus monitoring mask structure includes: a light-transmitting substrate, the substrate including a chip area and a plurality of monitoring areas, the substrate having a reference surface; a shading structure located on the substrate, each monitoring area having at least one monitoring mark group, each monitoring mark group including a plurality of mark grooves located between adjacent shading structures, the plurality of mark grooves being arranged along a first direction, the bottom of the mark grooves exposing the substrate surface, different mark grooves in the same monitoring mark group having the same size in the first direction, adjacent mark grooves in the same monitoring mark group having the same spacing, different mark grooves in the same monitoring mark group having different depths, the depth of the mark groove being the size of the bottom surface of the mark groove relative to the reference surface in a direction perpendicular to the substrate surface, thereby realizing online focus monitoring with less impact on the pattern of the product wafer.
