dry only.. U-Precision didn't publish information about DUVi. we can only estimate for immersion sets.
so Havok was spot on.. 20 dry machines+ 5 immersion this year.
Chinese semiconductor thread II
- Thread starter vincent
- Start date
so Havok was spot on.. 20 dry machines+ 5 immersion this year.
i don't believe Havok said 20 DUV, he said 20 DUV/DUVi total. I think we are far from knowing how many are actually getting put into production this year, but it's safe to say the production is ramping up now that Guowang, U-Precision are up supplying a lot more to SMEE.
anyhow, SMIC results
what does it mean when CIS or ISP are up 60% YoY? Well, Omnivision has increased it's share big time. That's what this means
anyhow, SMIC results
bright spot domestically are the phone suppliers, at least for SMIC
what does it mean when CIS or ISP are up 60% YoY? Well, Omnivision has increased it's share big time. That's what this means
DDIC/TDDI/AMOLED drivers all doing well. Guess what, domestic display suppliers are gaining and fabbing at SMIC
again, fully booked in 28-55nm nodes. a lot of demand for SMIC in these nodes.
If I look at what Tinrobert has written, you would need 10 Immersion DUV for monthly capacity of 50K wafers.
This is with 300mm wafers @ 28nm with a single pattern.
That sounds like the minimum size you would want for a 300mm fab. But ideally, it looks like a capacity of 100K is optimal.
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As for Dry DUV, my understanding is that ASML is still selling these without restriction.
So there isn't an urgent need to replace these.
Presumably you would also need 10 machines for a nameplate capacity of 50K wafers, but of course, this is at a larger node.
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And given that ASML operates with an average gross profit margin of around 100% (selling for double what it costs), there is a lot of space for a Chinese competitor. Even if the initial Chinese equipment from SMEE is worse and more expensive, there's still enough margin to be profitable.
Yeah things are quietly heating up fast in the lithography department. Looks like CAS and SMEE has solved the overlay problem in China with grating systems and new mark system, from now on ALL SMEE machines will have superior enhanced performance and precision. This is big.
Just a general observation
If I look at semiconductor equipment suppliers such as ASML, Lam Research and KLA - it looks like they operate with gross profit margins of around 100%. That is selling equipment for double what it costs to produce. Presumably the other smaller equipment suppliers are similar.
Then if you look at TSMC, it looks like they also operate with gross profit margins of 100%+
And the vast majority of TSMC's costs are due to capital equipment purchases, particularly for the more advanced nodes.
So if you were to take a scenario where the equipment suppliers and fabs were to instead accept a 40% profit margin (which is still worth doing), the final cost of semiconductors would be halved.
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It goes back to the point that there is a large amount of profit margin available for Chinese tech companies, even if their equipment and facilities currently aren't as good or are actually more expensive.
But as time goes on, we can expect Chinese costs for fabs and equipment to be less than foreign equivalents.
If I look at semiconductor equipment suppliers such as ASML, Lam Research and KLA - it looks like they operate with gross profit margins of around 100%. That is selling equipment for double what it costs to produce. Presumably the other smaller equipment suppliers are similar.
Then if you look at TSMC, it looks like they also operate with gross profit margins of 100%+
And the vast majority of TSMC's costs are due to capital equipment purchases, particularly for the more advanced nodes.
So if you were to take a scenario where the equipment suppliers and fabs were to instead accept a 40% profit margin (which is still worth doing), the final cost of semiconductors would be halved.
---
It goes back to the point that there is a large amount of profit margin available for Chinese tech companies, even if their equipment and facilities currently aren't as good or are actually more expensive.
But as time goes on, we can expect Chinese costs for fabs and equipment to be less than foreign equivalents.
manqiangrexue
Brigadier
Imagine a nation that has spent two decades trying to make an ordinary gas-powered car but keeps failing, making a barely functional product.
Then imagine that that nation suddenly tries to develop a cutting edge state of the art electric vehicle in half that amount of time. Not likel-wait... Nevermind...
And this is an aside to how wrong and oversimplified your analogy was in the first place. China is renowned for making slow progress until forced by Western sanctions, causing them to explode forth with decades of advances in years.
SMEE has been low key upgrading their website, no fanfare or news. The added 3 new type lithography metrology equipment including an overlay metrology system for their upcoming immersion machines rated up to a 7nm process node, which indicate that the upcoming 800 series are being planned to reach ASML more advanced machines.
Apart from that they upgraded their packaging <500 series> and MEMS-IOT<300 series> lithography machines to a new level.
Apart from that they upgraded their packaging <500 series> and MEMS-IOT<300 series> lithography machines to a new level.
I think it's more of an economic barrier than a technical barrier. The free market is ruthless efficient, just because you can technically develop an DUV doesn't mean there will be buyers. No buyers, means no profit, means investors won't give you the resources for R&D, it's a ruthless cycle from there. Thankfully, the US tech war has given SMEE an opportunity to iteratively improve with domestic fabs, and generous state subsidies to offset any inefficiency loss during the learning curve, China will be more than fine. I'm not worried, I'm worried about China scaling fast enough to meet the demand, not any bottlenecks which time will resolve.
Another new achievement of localized substitution - Kunteng Infrared launches the world's first Class II superlattice SF6 infrared thermal imaging detector
Zhejiang Kun Teng Infrared Technology Co., Ltd. (hereinafter referred to as "Kunteng Infrared") has ushered in another important new achievement of localization substitution through continuous technology investment and R&D trial production: in the second type of superlattice (T2SL) Based on the advantages of material technology, we will further deepen our development and move towards longer wavelength. This cooled infrared focal plane thermal imaging detector extends the wavelength to 11 μm-12 μm on the basis of covering ordinary long waves. The device is officially launched to cover the 10.3 μm-10.7 μm band, covering 320 × 256 and 640 × 512. array specifications. The detector can quickly and accurately locate the leakage location of harmful gas sulfur hexafluoride (SF6) in real time, and has the advantage of presenting thermal imaging views of gas leaks with high quantum efficiency, high definition, high sensitivity, and high accuracy.
Type II superlattice sulfur hexafluoride (SF6) infrared thermal imaging detector As an effective means of atmospheric environmental monitoring, sulfur hexafluoride (SF6) gas infrared thermal imaging detectors can be widely used in energy and power, environmental monitoring, petrochemical industry, ship transportation and other fields. It is especially suitable for the main work of medium and large substations in the power industry. Transformer fault monitoring. Once the main transformer of the substation fails, harmful gases such as sulfur hexafluoride (SF6) will leak. How to determine the leakage of harmful gases of SF6 through remote non-contact methods has always been a difficult problem in the industry. Sulfur hexafluoride <Semiconductor etchant gas>(SF6) gas infrared detector is a relatively effective monitoring method. For many years, its core detector has been satisfied by imported products from foreign manufacturers. Previously, the detectors used in domestically produced SF6 thermal imagers have been implemented through imported quantum well (QWIP) detectors. This time, Quanteng Infrared broke through technical barriers and took advantage of its Type II superlattice technology to overcome this technical problem and achieve new domestic substitution of core materials and technologies.
At the same time, Kunteng Infrared is also the first company in the industry in the world to launch a sulfur hexafluoride (SF6) gas infrared thermal imaging detector with type II superlattice technology, which can be described as another milestone in domestic substitution!
Can you provide a source for this? I think I have heard it somewhere but can't seem to find any source.