I'm surprise Nobody post this article, it's a very important and significant news, breaking Japan monopoly and a stepping stone for EUV photoresist in 2025 in conjunction with the prototype machine.
Recently, Wuhan Taiziwei Optoelectronics Technology Co., Ltd. in China launched its T150 A photoresist product, which has successfully passed mass production validation for semiconductor processes. With a fully self-designed formula, this achievement is expected to pave the way for a new era in China’s domestic semiconductor lithography manufacturing.
The T150 A product is benchmarked against the mainstream KrF photoresist series from leading international companies. Compared to the widely recognized UV1610 product in the same series, the T150 A demonstrates an extreme resolution of 120nm during the lithography process, offers greater process tolerance, higher stability, and excellent film retention after post-baking
Additionally, it is more compatible with subsequent etching processes. Validation revealed that dense patterns made with T150 A exhibit outstanding verticality of sidewalls in the underlying dielectric after etching.
Industry insiders have commented that, among KrF series photoresist products, the UV1610 product, which T150 A is benchmarked against, is considered a “commonly used resist” with high demand. Currently, Chinese manufacturers such as Beijing Kehua and Xuzhou Bokang have the capability to produce UV1610.
Currently, China’s semiconductor photoresist, especially for high-end products, is still heavily reliant on imports, with Japan being China’s largest source of photoresist imports.
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Recently, Wuhan Taiziwei Optoelectronics Technology Co., Ltd. in
China launched its T150 A
photoresist product, which has
successfully passed ...