Chinese semiconductor thread II

tinrobert

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Yes, he mentioned it awhile back.

Yes. The main reason I started writing for Seeking Alpha was to use the articles as a calling card for my Market Research reports, which are on my website at
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. Seeking Alpha lately started getting very restrictive, not allowing me to link my website to my articles. Meanwhile the quality of articles on Seeking Alpha was getting diluted by authors who had no expertise on the topic they were writing and copied and pasted from an earnings call. This cut down on the number of readers that would read my articles, and hence lowered the number of people accessing my website.
 

tokenanalyst

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Professor Lee Byeong-hoon, a professor in the Department of Semiconductor Engineering at POSTECH, was interviewed as follows.

The EUV (extreme ultraviolet) exposure equipment (equipment that finely draws circuit patterns on wafers) from the Dutch company ASML is considered the last bastion of technology blockade, but China is looking for a way to use synchrotron radiation accelerators that can produce light with a shorter wavelength than EUV. There are many technologies that need to be developed to use synchrotron radiation accelerators, such as light source utilization methods, photosensitive materials, and exposure systems. Therefore, the idea of replacing EUV with synchrotron radiation accelerators was considered absurd, but the extreme situation of blockade can change the nature of technology development.

Is Professor Lee’s interview true?
SSMB-EUV?
Well we have page after page after page after page of posts describing EUV photoresist materials, EUV projection objectives, the use EUV Interference Lithography (by the way it use synchrotron EUV radiation), China own MicroMirror "FlexRay" like system for light optimization, EUV Masks........
 

Hyper

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Registered Member
Well we have page after page after page after page of posts describing EUV photoresist materials, EUV projection objectives, the use EUV Interference Lithography (by the way it use synchrotron EUV radiation), China own MicroMirror "FlexRay" like system for light optimization, EUV Masks........
EUV IL is only for resist qualification and development. Not for production.
 

tokenanalyst

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Sugon's net profit in the first three quarters was 767 million yuan, a year-on-year increase of 2.36%​

Inspur released its performance report for the first three quarters of 2024, stating that its total operating revenue from January to September was 8,041,454,505.76 yuan, a year-on-year increase of 3.65%; its net profit attributable to shareholders was 767,970,600.49 yuan, a year-on-year increase of 2.36%; its non-net profit was 446,112,559.94 yuan, a year-on-year increase of 8.92; and its basic earnings per share was 0.526 yuan, a year-on-year increase of 2.33%.

As of the end of the reporting period, Sugon had total assets of RMB 32,614,548,563.97, owners' equity attributable to shareholders of the listed company was RMB 19,181,170,427.91, share capital was RMB 1,463,263,884, and net assets per share attributable to shareholders of the listed company was RMB 13.11.

Inspur said that during the reporting period, the company's main business was relatively stable. Facing fierce domestic market competition, the company insisted on R&D innovation, improved the layout of the industrial chain, promoted the construction of digital infrastructure, and steadily advanced various businesses. The company will continue to consolidate and enhance its core competitiveness through multi-dimensional measures such as continuously improving product quality, strengthening budget management, reducing costs and increasing efficiency.

 

tokenanalyst

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A major breakthrough has been achieved in the field of domestic semiconductor-specific photoresist, and has passed mass production verification!​


Optics Valley enterprise has achieved a major breakthrough in the field of semiconductor-specific photoresists: the T150 A photoresist product launched by Wuhan Tai Ziwei Optoelectronics Technology Co., Ltd. (hereinafter referred to as "Tai Ziwei Company") has passed the semiconductor process mass production verification and achieved fully independent formula design, which is expected to create a new situation in domestic semiconductor lithography manufacturing.

1728996964302.png

This product is benchmarked against the mainstream KrF photoresist series of international leading enterprises. Compared with the foreign same series product UV1610, which is called "demon glue" in the industry, T150 A has a limit resolution of 120nm in the photolithography process, and has a larger process tolerance, higher stability, and excellent film retention rate after hardening. It is more friendly to the subsequent etching process. Through verification, it was found that after the dense graphics in T150 A were etched, the side wall verticality of the lower dielectric layer was excellent.

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tokenanalyst

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The national standard "Test Transmission Electron Microscopy Method for Dislocation Imaging in Group III Nitride Semiconductor Materials" in which Inspur Huaguang participated in the formulation was officially released​


Recently, the national standard "Transmission Electron Microscopy Method for Testing Dislocation Imaging in Group III Nitride Semiconductor Materials", which was jointly formulated by Inspur Huaguang, was officially released by the State Administration for Market Regulation (National Standardization Administration), providing standard support for the testing of dislocation imaging in the fields of microelectronic devices and optoelectronic devices of Group III nitride semiconductor materials.

The article "Testing dislocation imaging in III-nitride semiconductor materials using transmission electron microscopy" describes the testing method of dislocation imaging in III-nitride semiconductor materials using transmission electron microscopy, which is applicable to the imaging test of dislocations in thin films or bulk single crystals of III-nitride semiconductors. III-nitride semiconductor materials mainly include GaN, AlIn, InN and the combination system of the above three materials, such as InGaN, AlGaN, AlInGaN, etc., which are the forefront and hot spot of global semiconductor research.

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GulfLander

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How much helium does semiconductor mfg use?​

"China is quietly extracting itself from a US helium ‘stranglehold’, experts say​

Years of research and development are helping China become less reliant on overseas sources of the valuable noble gas"

In an article published in late 2022 in the journal Frontiers in Environmental Science, several researchers from
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Beijing-based Research Institute of Petroleum Exploration and Development stressed that once the US imposed a “stranglehold” blockade on helium exports to China, the country’s helium supply would be “greatly restricted”......

"The US has a global monopoly on helium reserves and the most advanced helium extraction technology, they added.

But the dynamics have shifted significantly. Last month, achievements in helium extraction and related equipment development were nominated for an annual scientific award by the Chinese Academy of Sciences (CAS)........"
"The Technical Institute of Physics and Chemistry under the CAS, which backed the project, said it had successfully extracted helium from natural gas at the plant, located in China’s northwest.


There have been other breakthroughs. China has set its sights on extracting helium from
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.


Two years after it began a joint project in 2021 led by the China Coal Research Institute, the team said it had successfully overcome the challenges and mastered the technology."

"The world’s first high-purity helium extraction plant for coal bed methane was commissioned in China in 2023, opening up a new avenue to boost the country’s helium production.


Scientists are also seeking alternatives to helium to produce the ultra-low temperatures needed in hi-tech industries.


For example, an international team, including physicists from a CAS institute, have discovered a cobalt-based quantum magnetic material that could theoretically achieve ultra-low temperatures without relying on helium. Their findings were published in the peer-reviewed journal Nature in January."



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tphuang

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A major breakthrough has been achieved in the field of domestic semiconductor-specific photoresist, and has passed mass production verification!​


Optics Valley enterprise has achieved a major breakthrough in the field of semiconductor-specific photoresists: the T150 A photoresist product launched by Wuhan Tai Ziwei Optoelectronics Technology Co., Ltd. (hereinafter referred to as "Tai Ziwei Company") has passed the semiconductor process mass production verification and achieved fully independent formula design, which is expected to create a new situation in domestic semiconductor lithography manufacturing.

View attachment 137320

This product is benchmarked against the mainstream KrF photoresist series of international leading enterprises. Compared with the foreign same series product UV1610, which is called "demon glue" in the industry, T150 A has a limit resolution of 120nm in the photolithography process, and has a larger process tolerance, higher stability, and excellent film retention rate after hardening. It is more friendly to the subsequent etching process. Through verification, it was found that after the dense graphics in T150 A were etched, the side wall verticality of the lower dielectric layer was excellent.

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while this is good to see. Other companies like Xuzhou Bokang should already be supplying Arf photoresists.
 
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