Chinese semiconductor thread II
- Thread starter vincent
- Start date
The article pretty much says that the 65 nm system mentioned by MIIT is not ready for mass production or shipment, and that there is still a very large gap between domestic Chinese lithography systems and foreign ones.
The overlay is kind of low even for an ArF dry machine. MITT also does not state productivity of the system in wafers per hour or other such metrics. 65nm is an improvement over the 90 nm machine SMEE has available but probably not even good enough to replace ArF dry machine imports.
Same thing about the KrF machine. And these machines are still in wide use in the industry for up to 150nm process. For example most of Nexchip's and Hua Hong Wuxi's production is likely done with imported KrF machines.
Same thing about the KrF machine. And these machines are still in wide use in the industry for up to 150nm process. For example most of Nexchip's and Hua Hong Wuxi's production is likely done with imported KrF machines.
Actually，Krf machine is being used in 2nm process as well
Even if these machine is not anything close to cutting edge, just happy that China increase the domestic share in the supply chain. Even if we only complete the mature node sector then many foreign ones will go either bankrupt or at least in massive trouble.
Except if they perform worse than imported machines, they will still be imported. The exception would likely be CETC and other government contractors.
Please don't mislead the world! MD-80/90 had 150-180 passenger capacity while ARJ-12 has 60-80 capacity. They are totally different beasts.
That is is the worst debunking ever, the article is not even debunking nothing.
The document stated that the ArF dry is below 8nm, final overlay, probably, could be 6nm, closer to ASML current 5nm for dry lithography they feel confident that at least 8nm can be archived repeatable, 65nm is a pretty big leap from SMEE previous 90nm, given that RSLaser ArF light source is about 40W to 60W 4000khz to 6000khz and U-Precision stated WAY BACK in 2016 that they dual wafer stage was capable of 150 300mm wafers per hour, so is safe to say that this machine is pretty capable of handling between 150-230 300mm WPH or more.
The KrF scanner final overlay seems low, 25nm, but that is because probably looks like the want to keep that machine very cheap given that KrF lithography is used more than ArF dry and I-line in fab for metal layers. In theory it could be as low as the ArF scanner if the use the same overlay systems but that will made the system more expensive.
another point to be noted, Digitimes completely misreporting here regarding 65nm yet to enter in production and shipment .. Neither Ministry of IT mentioned about this but he automatically assume.. LOL
U-Precision IPO reveal, they have delivered 4 sets of dry dual-stage workpiece in 2020-2021 and additional 4 were delivered in 2022 .
U-Precision delivered another 10 units of dry machine in 2023 ..
don't know why some members blindly believe on Digitimes.. @Wahid145
Given that the a lot of projects are funded by the goverment, is a pretty big chunk of the semiconductor market that ASML could be losing and give the current geopolitical situation is very probably that SMIC, YMTC, CXMT and others jump onboard with these scanners at least in some layers and some nodes like 55nm and 180nm to keep pushing for domestic solutions to ASML.
So ASML could be losing China dry lithography market, if these tools are mass produced and improved. Along the EUV and high end immersion lithography market in China, leaving with ASML selling just two mid range variants of their products 1980i and the 1970i to a few costumers. Is becoming a case of "having the US as your friend is fatal"