Develop a high-yield 110nm new principle high-yield lithography machine based on the principle of holographic lithography, break through the key technologies of core components, subsystems and complete machines, break foreign embargoes, fill domestic gaps, and form core competitive advantages such as cost-effectiveness. The funds applied for are intended to be used for equipment costs, material costs, and outsourcing processing costs in the development of new principle high-yield lithography machines. Relying on the research and development team of the Precision Instrument Engineering Research Institute of Harbin University of Technology (led by academicians and 240 people with doctoral degrees), we have mastered all the core technologies of this lithography machine and have started the research and development of this project since October 2023. This project also includes the National Lithography Machine Industry Metrology and Testing Center approved by the General Administration of Quality Supervision, Inspection and Quarantine in January 2024 to support the research and development of the complete lithography machine of this project.