Chinese semiconductor thread II

[tokenanalyst]

Interesting this Company in Suzhuo is making SIC crystal growth equipment using a resistance heating method which they say give better temperature uniformity and less defects.

Suzhou U-Jing Semiconductor Technology Co., Ltd.

Suzhou Uking Semiconductor Technology Co., Ltd. is a high-tech enterprise focusing on the research, development, production and sales of large-size (6 inches and above) conductive silicon carbide crystal growth equipment. After years of hard work in the research and development of resistance-based silicon carbide crystal growth equipment and processes, the company successfully developed a 6-inch resistance-based silicon carbide single crystal growth equipment in 2019. After continuous process optimization, it has now launched the fourth-generation model - UKING ERH SiC RV4.0 resistance-based silicon carbide crystal growth equipment, which can be used for 6-inch and 8-inch mass production. With its excellent equipment performance and crystal growth technology, the company has been recognized by many well-known silicon carbide industry chain manufacturers at home and abroad, and has achieved bulk sales to customers.

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[tphuang]

But profit drops 59% to $164.6 million

look at the capex for the quarter $2.5b
That’s more than the total revenue.

https://twitter.com/i/web/status/1821553683861217307

there is a reason SMIC profit dropped. Its investing insane amount of capex for a fab of its size. The depreciation is eating up all the profits. This is the right approach. They are now on pace for $10b capex this year. That’s basically 40-50% of what intel is spending per year in 2024 and 2025.

and their utilization is way up. This is a great quarter for SMIC.

look at that increasing share from smartphones and consumer electronics. Chinese consumer electronics industry is making a huge comeback.

 

[european_guy]

look at the capex for the quarter $2.5b
That’s more than the total revenue.

https://twitter.com/i/web/status/1821553683861217307

there is a reason SMIC profit dropped. Its investing insane amount of capex for a fab of its size. The depreciation is eating up all the profits. This is the right approach. They are now on pace for $10b capex this year. That’s basically 40-50% of what intel is spending per year in 2024 and 2025.

and their utilization is way up. This is a great quarter for SMIC.

look at that increasing share from smartphones and consumer electronics. Chinese consumer electronics industry is making a huge comeback.

In this case the reason for the drop is very specific and detailed in the official report under "Other income"



Mainly it is a simple depreciation of financial assets owned by SMIC: they reduced the book value of some securities they own (that possibly were overpriced before).

It has nothing to do with production/market, it's a pure financial thing, definitely not something that can scare investors.

 

[sunnymaxi]

Anyone with a "just hatched", "new member", "junior member" title can pretty much be ignored or ignore listed entirely.

yeah. i think we should have a rule. all new Members must read previous pages of this thread before comment..

28nm/14nm de-Americanized line has been completed and domestic tools verifying on 7nm as well.. outside Lithography most of the tools sourced from domestic firms include Photoresists and EDA. Finfet capable Photoresist mass production begun too.

NAURA/AMEC/ACM/Kingsemi/Piotech.. all these firms have 100+ percent yoy growth in revenue in H1,2024 despite record breaking 2023

Metrology/Inspection and testing equipment are the fastest growing sector right now..

DUV serial production begun too..

 

[latenlazy]

yeah. i think we should have a rule. all new Members must read previous pages of this thread before comment..

28nm/14nm de-Americanized line has been completed and domestic tools verifying on 7nm as well.. outside Lithography most of the tools sourced from domestic firms include Photoresists and EDA. Finfet capable Photoresist mass production begun too.

NAURA/AMEC/ACM/Kingsemi/Piotech.. all these firms have 100+ percent yoy growth in revenue in H1,2024 despite record breaking 2023

Metrology/Inspection and testing equipment are the fastest growing sector right now..

DUV serial production begun too..

Alternatively there needs to be a pinned post that summarizes progress with relevant links. Even if you implement such a rule no one new is going to know and there’s no way to enforce such a rule.

 

[measuredingabens]

Alternatively there needs to be a pinned post that summarizes progress with relevant links. Even if you implement such a rule no one new is going to know and there’s no way to enforce such a rule.

It's high time that a proper threadmark system is implemented. These threads are long enough and the search function is almost useless.

 

[HighGround]

Alternatively there needs to be a pinned post that summarizes progress with relevant links. Even if you implement such a rule no one new is going to know and there’s no way to enforce such a rule.

It's also unreasonable to expect people to be caught up with... hundreds of pages worth of content. Which is what new people get asked to do when they ask something that's been established for a many months and get told to read the thread. It took me weeks to go through the previous thread and this thread when I first started. Granted, I don't post much here but I think editing permissions to not allow new users to post at all would make a lot of sense.

It's quite annoying to try to catch up on 20 pages of this thread after a week or so, just to see a lot of spam posts.

 

[tokenanalyst]

Extreme ultraviolet light source generating device and method​

Hubei Institute Of Measurement And Testing Technology
CN118244587A

Abstract​

The invention provides a generating device and a method of an extreme ultraviolet light source, wherein the device comprises a tin droplet generator for forming tin droplets with uniform spacing; the pulse laser is used for generating a first laser pulse and horizontally emitting the first laser pulse to the pulse modulator; the pulse modulator is used for modulating the first laser pulse to form a second laser pulse with energy annularly distributed; a laser beam expander for horizontally directing the second laser pulse to the first mirror; a first mirror disposed below the second mirror for reflecting the second laser pulse upward to the second mirror; and the second reflecting mirror is of a hollow design, is arranged below the tin droplet generator and is coaxial with the movement track of the tin droplet, and is used for reflecting and focusing the light spot of the second laser pulse to the tin droplet so as to generate extreme ultraviolet light. The device and the method improve the stability and the accuracy of the synchronous action of the high-frequency pulse laser and the high-frequency jet liquid drop, and are beneficial to the stable generation of extreme ultraviolet light.​

 

[latenlazy]

Extreme ultraviolet light source generating device and method​

Hubei Institute Of Measurement And Testing Technology
CN118244587A

Abstract​

The invention provides a generating device and a method of an extreme ultraviolet light source, wherein the device comprises a tin droplet generator for forming tin droplets with uniform spacing; the pulse laser is used for generating a first laser pulse and horizontally emitting the first laser pulse to the pulse modulator; the pulse modulator is used for modulating the first laser pulse to form a second laser pulse with energy annularly distributed; a laser beam expander for horizontally directing the second laser pulse to the first mirror; a first mirror disposed below the second mirror for reflecting the second laser pulse upward to the second mirror; and the second reflecting mirror is of a hollow design, is arranged below the tin droplet generator and is coaxial with the movement track of the tin droplet, and is used for reflecting and focusing the light spot of the second laser pulse to the tin droplet so as to generate extreme ultraviolet light. The device and the method improve the stability and the accuracy of the synchronous action of the high-frequency pulse laser and the high-frequency jet liquid drop, and are beneficial to the stable generation of extreme ultraviolet light.​

View attachment 133847

Ohhh this one’s really interesting. Wonder how much they’re able to improve conversion efficiency with this approach.

 

[interestedseal]

single-crystalline Al2O3 sapphire as a high-quality dielectric layer on the 2D MoS2 FET

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A lot of next-gen transistor research happening