Chinese semiconductor thread II
- Thread starter vincent
- Start date
It is too late for these bumbling idiots. SMIC probably already got most of the tooling they needed for their 340,000 wpm 28nm 300mm diameter wafer expansion.
European companies like STMicro are still stuck at 28nm and have nowhere near this capacity. I expect STMicro and Renesas to be major losers.
European companies like STMicro are still stuck at 28nm and have nowhere near this capacity. I expect STMicro and Renesas to be major losers.
Ami Precision Control Technology Completes Pre-A+ Round of Financing
Recently, Ami Precision Control Technology (Shandong) Co., Ltd. (hereinafter referred to as "Ami Precision Control") completed a pre-A+ round of financing of tens of millions of yuan. This round of capital increase was jointly completed by Shenzhen Capital Group, Hongtai Fund and old shareholder Yichen Capital.
Ami Precision Control was founded by a national team of high-level talents . It is mainly engaged in the research and development of micro-nano measurement and motion control technologies and the manufacturing of high-performance optomechanical and electromechanical products , and provides nano-level measurement and control and motion servo solutions .
Ami Precision Control has fully independent technologies and representative products in nano displacement sensors, nano positioning/scanning platforms, cross-scale nano motion systems, direct-drive high-speed micro-nano motion systems, and ultra-high performance optical-mechanical systems, and holds more than 30 related invention patents . The company's products are mainly used in emerging industries such as integrated circuit equipment, micro-nano manufacturing, precision/active optics, and scientific instruments. It has established in-depth technical cooperation and product matching relationships with many leading companies in the above fields.
The rapid development of representative industries in the field of precision engineering, such as integrated circuit manufacturing and precision scientific instruments, has brought important development opportunities to the core component markets such as micro-nano measurement and motion control modules. At the same time, the country has introduced a series of policy measures to strengthen and supplement the supply chain in the fields of semiconductors, electronic information, and advanced manufacturing, which will further promote the innovation capabilities of national brands and the development of cutting-edge products. Ami Precision Control will benchmark national strategic needs and seize important opportunities for industrial development. Through this round of capital increase, it will accelerate the establishment of an independent technology system for nano-level measurement and motion control systems , strengthen the construction of high-quality product process flow, and improve sales and pre-sales/after-sales layout for key industries and regions to achieve high-quality leapfrog development.
Nano Precision motion for semiconductor equipment and metrology
Numerical investigation of discharge evolution and breakdown characteristics of ArF excimer lasers.
Xi'an Jiaotong University, National Key Lab of Aerospace Power System and Plasma Technology
Xi'an Jiaotong University, National Key Lab of Aerospace Power System and Plasma Technology, Xi'an Jiaotong University
Beijing RSLaser Opto-Electronics Technology CO.,Ltd., Beijing RSLaser Opto-Electronics Technology CO.,Ltd., Beijing
Abstract
The corona bar induced pre-ionization is a crucial preliminary process in the operation of ArF excimer lasers, directly impacting the uniformity and stability of output laser. However, the ultraviolet corona pre-ionization, as the mainstream method, is tightly coupled with the main discharge process, which complicates analysis. Here, we establish a numerical model of a single pulse discharge incorporating an external circuit to analyze the pre-ionization process and its influence on the breakdown characteristics. (1) By adopting detailed input parameters of photoionization model, we observe uniform and dispersed plasma propagation from the corona bar to the main gap. (2) An artificial boundary condition is proposed to investigate the phenomenological effect of high-energy electrons emission, emphasizing the influence of surface discharge along the cathode. (3) The differences between the two pre-ionization setup methods, photoionization and background electron density, are compared numerically. This study enhances the understanding of the pre-ionization process in ArF excimer lasers and provides theoretical insights for their optimization and design.
I know that few here have a digitimes subscription, but does anyone know if there was anything of substance in yesterday's article summarized as "China seems to be deliberately playing down the importance of lithography tools as it identifies the challenges for the development of its semiconductor industry in a recently published dossier." Even if true, that could have many causes.
Obfuscation.