Preparation method and processing equipment of extreme ultraviolet light source collecting mirror
Changchun Institute of Optics Fine Mechanics and Physics of CASCN117891139A
Abstract
The invention relates to a preparation method and processing equipment of an extreme ultraviolet light source collecting mirror, wherein the method comprises the following steps: manufacturing a mirror blank; preliminary processing of the surface of the substrate; preparing a silicon modified layer; polishing the surface of the silicon modified layer; detecting the surface type precision and roughness of the collecting mirror; photoetching a grating structure on the surface of the collecting mirror; detecting the machining precision of the grating structure; coating a film on the surface of the grating structure; parameters of the collection mirror are detected. According to the invention, the collecting mirror substrate is made of the silicon carbide material, so that the thermal deformation of the collecting mirror substrate in the working process is reduced, silicon is used for modifying the surface of the substrate, and the consistency of the linear expansion coefficients of the collecting mirror substrate and the modified layer is improved. The photoetching is adopted to process the surface grating structure of the collecting mirror, so that the requirement on ultra-precise processing equipment is reduced, and the problem of insufficient precision of the surface grating structure of the collecting mirror which is processed by an ultra-precise lathe and modified by silicon is solved. The special curved surface exposure equipment is designed and used, so that the curved surface exposure problem is solved, and the processing precision of the grating structure is further improved.
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