Chinese semiconductor thread II

tokenanalyst

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I agree with Wahid, I think if possible, statements like this would benefit from indicating the source.

Also, what was the original formatting for the paragraph? It seems like only the first sentence is directly EUV related.

There was a post in the past thread of certain company buying and refurbishing Nikon Immersion scanners that different from ASML are more hardware than software so those are easier to modify, with another domestic company that refurbish these scanners" . That coincide with the pretty fast development of interferometry in China.


The part of 5nm FinFet reaching the performance of 3nm GAAFET is almost impossible to verify without insider information, but we all know that they are developing 5nm FinFET as we speak, we will have to wait until more information come out.
 

tokenanalyst

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Nanchang Zhongwei won the title of "Jiangxi Province Manufacturing Single Champion Enterprise"​


Recently, Nanchang Zhongwei Semiconductor Equipment Co., Ltd. (hereinafter referred to as "Nanchang Zhongwei"), a wholly-owned subsidiary of Zhongwei Semiconductor Equipment (Shanghai) Co., Ltd. (hereinafter referred to as "Zhongwei"), won the "Jiangxi Province Manufacturing Individual Championship" Enterprise" title. It is reported that a total of 27 companies in Jiangxi Province have been selected into the list of individual champion companies in the manufacturing industry in Jiangxi Province in 2023. As one of the five Nanchang companies on the list, Nanchang Zhongwei was once again commended for its production technology and advanced technology.

According to the "Measures for the Recognition of Individual Champion Enterprises in the Manufacturing Industry of Jiangxi Province", individual champion enterprises in the manufacturing industry refer to enterprises that have long-term focus on certain specific product segments in the manufacturing industry, have advanced production technology or processes, and have a single product market share among the top in the country. enterprise. After recommendation, review, publicity and other procedures, Nanchang Zhongwei was awarded the title of "Jiangxi Province Manufacturing Single Champion Enterprise" by the Jiangxi Provincial Department of Industry and Information Technology with its advanced capabilities and market recognition in the field of production and manufacturing. The certification is valid from December 2023. From November 1 to November 30, 2026.

Sinomicro settled in Nanchang High-tech Zone in 2017, established a wholly-owned subsidiary Nanchang Sinomicro, and successfully achieved mass production in September 2018. With its leading technical advantages and high-quality customer service, the MOCVD equipment produced by Nanchang Zhongwei for the production of LED and power device epitaxial wafers continues to be widely recognized by customers and the market. In 2021, Nanchang Zhongwei launched the Prismo UniMax® MOCVD equipment designed for the mass production of Mini-LED, which is mainly used for the mass production of gallium nitride (GaN)-based Mini LED epitaxial wafers. In the same year, its equipment orders exceeded 100 cavities and was selected in Jiangxi Top ten typical cases of transformation of provincial scientific and technological achievements.

In the past five years, with the strong support of relevant departments and all walks of life, Nanchang Zhongwei’s total number of employees, output value, R&D capabilities and operating performance have all achieved leapfrog growth. In 2022, Nanchang Zhongwei achieved operating income of approximately 1.919 billion yuan, a year-on-year increase of 204.83%, setting a new high in the past five years. In July 2023, Nanchang Zhongwei's new factory covering an area of about 130 acres and a total construction area of about 140,000 square meters was announced to be completed, further improving the company's product research and development and production capabilities. It is an important milestone in the development process of Zhongwei. It has opened up a new situation in order to gather development potential and achieve leapfrog breakthroughs.

In the future, Sinomicro will continue to consolidate the company's core competitiveness in the field of high-end micro-processing equipment, adhere to the corporate culture of the "Four Ten", further promote the three-dimensional development strategy, and achieve high-speed, stable, healthy and safe development.

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ansy1968

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Domestic EUV

"The EUV lithography machine led by a certain domestic company is about 2-3 years slower than the immersion DUV lithography machine led by SMEE. The core component of the Nikon NSR lithography machine they bought uses a domestic Zeeman-birefringent dual-frequency laser for the laser interferometer. The interferometer was replaced. After the test, it was found that the measurement accuracy reached 6 nanometers, which greatly helped the calibration and further improved the accuracy of the machine. As for the finfet self-developed by a certain company, by expanding the gate area, the 7-nanometer finfet can match the overall performance of the 3-nanometer GAA, and it only requires DUV to do it, and the cost is lower. Therefore, a certain company has started production of equivalent 7nm-5nm chips this year."
Wow!!!! then it can also be used in ASML machine as well?, an import substitution component? What interest me is the Chinese component parts can be interchange between, SMEE, ASML and Nikon That will be a game changer.
 

tokenanalyst

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CoolSo Technology, Tsinghua U Among EE Challenge Winners​

m’AI Touch extends ‘social distancing’ to buttons


During the recent pandemic, people became concerned about using public panels and buttons. Current solutions like disinfectant film, voice recognition and sensor technology have limited preventive effects. Those solutions also come up against environmental factors.


Addressing this issue, students from the National Tsing Hua University designed “m’AI Touch,” a non-contact, anti-epidemic device—and won the grand prize for doing so.

This design, focusing on human-centric approaches, employs heterogeneous sensor design and time-series data fusion technology for high-quality, time-series sensing. It uses AI models and edge-computing devices for fast and accurate predictions, enabling non-contact operation. Future applications include food-ordering machines, vending machines and ATMs.​

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pbd456

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Domestic EUV

"The EUV lithography machine led by a certain domestic company is about 2-3 years slower than the immersion DUV lithography machine led by SMEE. The core component of the Nikon NSR lithography machine they bought uses a domestic Zeeman-birefringent dual-frequency laser for the laser interferometer. The interferometer was replaced. After the test, it was found that the measurement accuracy reached 6 nanometers, which greatly helped the calibration and further improved the accuracy of the machine. As for the finfet self-developed by a certain company, by expanding the gate area, the 7-nanometer finfet can match the overall performance of the 3-nanometer GAA, and it only requires DUV to do it, and the cost is lower. Therefore, a certain company has started production of equivalent 7nm-5nm chips this year."
How could a 7nm finfet match the performance of 3nm gaa? Seem a bit far fetched
 

measuredingabens

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How could a 7nm finfet match the performance of 3nm gaa? Seem a bit far fetched
That be might in relation to Samsung's 3nm node (since it's the only one with a GAA process curently), in which case it's pretty up in the air since every foundry is different, and we have no way to verify this information. Samsung's nodes have also underperformed relative to TSMC's equivalents, so it may not be out of the question that what's marketed as an older process might be able to match the former's 3nm node.
 
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