Chinese semiconductor thread II

tokenanalyst

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Eilenx 16nm SiP FPGA​


Eilensil (Elitestek) has launched a new lineup of System-in-Package (SiP) FPGA products based on its mature 16nm Titanium Series, designed to address growing engineering challenges in embedded vision, edge computing, and smart devices where rising compute demands clash with tight constraints on board space, power, and supply chain complexity. By integrating FPGAs with memory (DRAM, HyperRAM, Flash) into a single compact package, these SiP solutions eliminate complex board-level storage wiring, shorten interconnect paths for higher-speed data transfer, and significantly reduce PCB footprint delivering smaller, higher-performance, and simpler-to-design systems.

The product matrix includes five tailored offerings: the Ti125M225 (8×8mm, with SPI Flash + dual HyperRAM) for IoT and robotics; the TJ135D576SX (16×16mm, 2Gb LPDDR4x + 16Gbps SerDes) for video processing and automotive ADAS; the TJ180A484S (15×15mm, 176K logic cells + LPDDR4x) balancing performance and power for visual systems; the ultra-compact Ti60F100S3F2 (5.5×5.5mm, HyperRAM + SPI Flash) for multi-sensor and thermal imaging applications; and the FL60 (12×12mm, DDR3L-integrated) for AIoT and mobile edge devices. Key advantages across the lineup include SEU error correction, support for high-speed interfaces (MIPI, LVDS, PCIe Gen4, 10GbE), ultra-low power consumption (1–2W), and built-in security and reliability features.​

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tokenanalyst

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Jingsheng Mechanical & Electrical's subsidiary, Qiushi Innovation, successfully delivered thin film deposition equipment.​

Recently, Zhejiang Qiushi Chuangxin Semiconductor Equipment Co., Ltd. (hereinafter referred to as "Qiushi Chuangxin"), a subsidiary of Jingsheng Mechanical & Electrical, successfully delivered several advanced core thin-film deposition equipment for advanced processes to leading domestic customers. This delivery not only demonstrates Qiushi Chuangxin's technical strength and mass production capabilities in the field of high-end semiconductor equipment, but also marks the company's entry into the industry-leading level in key process links such as 12-inch epitaxy and atomic layer deposition for integrated circuit equipment.

The 12-inch depressurized epitaxial growth equipment delivered this time focuses on two core areas: advanced logic and specialty silicon photonics devices. Relying on precise temperature field process control technology, it achieves high-precision silicon-based thin film deposition processes. It has technical advantages such as strong stability, excellent uniformity, and controllable defects. It can fully meet the epitaxial process requirements of silicon photonics devices, advanced logic, and high-end memory chips, and is deeply adapted to domestic advanced wafer manufacturing processes.
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This successful repeat order from a leading domestic customer is strong evidence that the company's independently developed equipment has passed rigorous testing on the 12-inch wafer production line, and that the market highly recognizes the company's product capabilities.

The plasma-enhanced atomic layer deposition (PEALD) equipment, delivered simultaneously to leading domestic customers, is an advanced atomic layer deposition system designed specifically for the integrated circuit manufacturing industry. It can be widely used in scenarios such as capacitor metal plates and dielectric layers, metal interconnect diffusion barrier layers, and photolithographic multi-pattern spacers. The equipment achieves stable thin film growth under the coupled conditions of plasma, thermal field, and flow field, and combined with precise pressure control technology in the vacuum zone, ensures high stability of the deposition process.

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The entry of ALD products into the production lines of leading domestic customers represents a significant leap forward for the company in the field of core semiconductor equipment, laying a solid foundation for further expansion into the high-end integrated circuit manufacturing market.

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tokenanalyst

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SVG Optronics Launched the iPackLitho, Digital Lithography For Advanced Semiconductor Packaging.


The iPackLitho advanced packaging digital lithography system , making its global debut , became the focus of the entire event.
This system, designed for advanced packaging, is available in W-type wafer-level and P-type panel-level models. It employs maskless digital lithography and programmable array spatial light modulation technology, supporting multi-layer overlay and adaptive alignment compensation. It effectively adapts to warpage and deformation, enabling rapid response to design changes and providing highly adaptable layout and routing solutions for advanced packaging. This facilitates highly integrated and reliable manufacturing in semiconductor and CPO industries. On-site technicians explained the equipment's multi-layer overlay capabilities for 2.5D/3D advanced processes, earning high praise.

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Interesting to see Maskless Systems advancing in packaging​
 

tokenanalyst

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TiO2 protective capping for EUV mirrors: superior hydrogen plasma resistance and Sn contaminants removal.​

Abstract​

The long-term stability of extreme ultraviolet (EUV) lithography mirrors relies on protective capping layers capable of resisting plasma irradiation while simultaneously facilitating the removal of Sn contaminants. TiO2, Ru, and RuO2 coatings are comparatively assessed using density functional theory (DFT) and hydrogen-plasma cleaning experiments. TiO2 exhibits weak Sn adhesion (0.11 eV), enabling complete removal within 8 h under non-damaging power (1 W), whereas Ru/RuO2 retain persistent residues (>24 h) due to strong chemisorption and catalytic SnH4 re-deposition. TiO2 also demonstrates superior hydrogen-barrier properties, including inert adsorption (+0.34 eV), a high diffusion barrier (1.57 eV), and excellent reduction resistance. In contrast, Ru shows strong hydrogen adsorption (−0.64 eV) and low permeation barriers (1.02 eV), while RuO2 undergoes hydrogen-induced reduction with structural degradation. Comparable Sn-removal kinetics on polycrystalline and single-crystalline TiO2 further confirm insensitivity to grain boundaries. The unique combination of weak adsorption for contaminants, robust hydrogen impermeability, and reduction resistance in TiO2 establishes it as a highly effective capping layer for extending EUV mirror lifetime in plasma environments.

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huemens

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ASML CEO responds to a question regarding the 'reverse engineering' claim made by the Reuters article months ago.
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There are also reports that former ASML engineers in China have reverse-engineered your machines.

To reverse-engineer anything, you first need to have the machine. And there is no EUV machine in China — we never shipped any tools there. All the tools we have shipped, we know where they are. They’re either in use with customers, and we track those, or they’ve been dismantled and came back to us. The idea that one of our systems is in China is simply wrong. And because our EUV technology has never been exported there, we also have no people in China trained on EUV.

Very early on, when restrictions came in, we created a complete separation within the company between those who can access EUV technology, documents, and training, and those who cannot. Our team in China sits on the other side of that line. The facts point to very little, if any, progress at all. It’s hard for people to accept that because access to this technology is so important.
 

tokenanalyst

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ASML CEO responds to a question regarding the 'reverse engineering' claim made by the Reuters article months ago.
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The whole interview is mostly stock salesman speech sprinkled with an appealing to US politicians and Chinese costumers. Appealing to all sides.

"Export controls good and we comply"
"Export controls bad because we are not selling our most expensive immersion scanner"

"Competition against ASML will never appear so don´t short our stock"
"We need to sell of scanners because if we don´t it will give a competitive edge to competitors"

ASML is such easy pick for Think Tanks clowns that is almost laughable, they sell their technology basically as magical and they have an overly acute amount of media exposure that you don´t see in others semiconductor equipment companies like KLA.

With the latest revision of the Match Act I think US companies can still make money from China, except ASML. In theory you could have SMEE immersion scanners paired with US made processing and metrology equipment. US companies could be showering in Chinese money while ASML sit solitary in the corner watching 1/4 of the revenue evaporate.
 

Wahid145

Junior Member
Registered Member

Jingsheng Mechanical & Electrical's subsidiary, Qiushi Innovation, successfully delivered thin film deposition equipment.​

Recently, Zhejiang Qiushi Chuangxin Semiconductor Equipment Co., Ltd. (hereinafter referred to as "Qiushi Chuangxin"), a subsidiary of Jingsheng Mechanical & Electrical, successfully delivered several advanced core thin-film deposition equipment for advanced processes to leading domestic customers. This delivery not only demonstrates Qiushi Chuangxin's technical strength and mass production capabilities in the field of high-end semiconductor equipment, but also marks the company's entry into the industry-leading level in key process links such as 12-inch epitaxy and atomic layer deposition for integrated circuit equipment.

The 12-inch depressurized epitaxial growth equipment delivered this time focuses on two core areas: advanced logic and specialty silicon photonics devices. Relying on precise temperature field process control technology, it achieves high-precision silicon-based thin film deposition processes. It has technical advantages such as strong stability, excellent uniformity, and controllable defects. It can fully meet the epitaxial process requirements of silicon photonics devices, advanced logic, and high-end memory chips, and is deeply adapted to domestic advanced wafer manufacturing processes.
View attachment 174514
This successful repeat order from a leading domestic customer is strong evidence that the company's independently developed equipment has passed rigorous testing on the 12-inch wafer production line, and that the market highly recognizes the company's product capabilities.

The plasma-enhanced atomic layer deposition (PEALD) equipment, delivered simultaneously to leading domestic customers, is an advanced atomic layer deposition system designed specifically for the integrated circuit manufacturing industry. It can be widely used in scenarios such as capacitor metal plates and dielectric layers, metal interconnect diffusion barrier layers, and photolithographic multi-pattern spacers. The equipment achieves stable thin film growth under the coupled conditions of plasma, thermal field, and flow field, and combined with precise pressure control technology in the vacuum zone, ensures high stability of the deposition process.

View attachment 174515
The entry of ALD products into the production lines of leading domestic customers represents a significant leap forward for the company in the field of core semiconductor equipment, laying a solid foundation for further expansion into the high-end integrated circuit manufacturing market.

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Ok whats going on here @tokenanalyst ? I lost count into how many Deposition companies popping up in CHina in last 4-5 years. Do you have a track? It feels like the EV industry, hundreds of players concurrently...
 

tokenanalyst

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Ok whats going on here @tokenanalyst ? I lost count into how many Deposition companies popping up in CHina in last 4-5 years. Do you have a track? It feels like the EV industry, hundreds of players concurrently...
To start deposition is an enormous market, different techniques (Chemical based, Physically based, Oxidation, Atomic layer, Epitaxial Growth, Electro Chemical Deposition....), even these categories had sub-categories (PEALD, Thermal ALD, Flowable ALD, HDPCVD, PECVD, Atmospheric pressure CVD, PVD sputtering, PVD thermal, PVD Laser...)

A big chunk of the periodic tablet is used in many kind of processes, way many products require thin films (photovoltaics, power semiconductors, logic, memory, compound semiconductors, photonics and even coating components for other tools like the mirrors of EUV machines and so on). Is more complex and less straight forward than lithography. In a logic process you may require one tool for Hafnium deposition.

Remember that US banned the sale to china of the equipment needed for the deposition of just one compound SiGe (Silicon Germanium) that is needed to make FinFets and GAAFETs for the 5nm and below process.

There are too many? According to Abachy a directory of semiconductors companies says that there are 15 thin film equipment companies (I think probably is a bit more like 30 because the directory doesn't list all companies), in a country with almost 1/3 of the global production.
The directory list 21 in Japan and 36 in the US. You know how much are a Denmark? 22 companies, a country that don't even huge semiconductor production.
Is normal for companies to have overlapping products? Well Applied Materials and Lam compete basically in the same tools category from etching and deposition. I think at the end most of market share will consolidate in a few big companies with the rest moving to niche categories or going out bussiness.​
 
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tokenanalyst

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With a total investment of 500 million yuan, Jingchuang Advanced signed an agreement for a 12-inch semiconductor advanced packaging full-chain project.​

According to a news release from Changshu Economic and Technological Development Zone, on May 6th, the zone's semiconductor industry chain gained another strong new boost with the signing of the Jingchuang Advanced 12-inch semiconductor advanced packaging full-chain project. Jingchuang Advanced is a representative of high-quality science and technology innovation enterprises independently cultivated and grown within the zone, and has now become a leading domestic supplier of 12-inch advanced packaging cutting/grinding/polishing full-chain equipment, both internationally and domestically. This expanded project will further strengthen and complete the industry chain, propelling the regional semiconductor equipment industry towards a higher level.

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jx191

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ASML CEO responds to a question regarding the 'reverse engineering' claim made by the Reuters article months ago.
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CEOs say stuff like this all the time. He's pretending to be confident because he wants to boost his own business.

China is very secretive about EUV, that guy has no knowledge of what's happening on the ground.

Interesting to see how different his position is to Jensen Huang when he talks about China.

Both big CEOs with concerns about China, but different attitudes
 
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