Yes......i share your concerns and others about this issue.@WTAN , @foofy, and all others with privileged, insider information. I suggest to you and anybody else with privileged information to consider if any specific insider information holds the potential to negatively affect the policy decision making of the US government. For example, if you were to pre-announce a DUVL or EUVL machine BEFORE it is delivered or some kind of breakthrough that would catapult China tech above the leading edge. This kind of critical information will inform hostile think tankers and anti-China Western journalists, that are active in these forums, to report this to their backers and superiors in the US government. Until now, the US elite have been in denial of China's capabilities. They explain it all away with derogatory thinking like it is all copied or stolen and this is why they believe they can block and even reverse China's development. We can't give the drop to these morons. Not all of them are so delusional. Most of their thinking is clouded with ideology, ignorance, emotion, group-think and often racism. We need to keep them in this state for as long as possible. Right now, these mounting smears, slander and sanctions have been an incredible gift for China. They have united China's population like never before and forced a comprehensive tech independence drive. In the future, this will be looked back on as the reason China not only overtook America+puppets in technology but also in world markets. It is a once in a century opportunity on a silver platter. Please use caution and wisdom.
What has really surprised me is that this Forum which started off as a small place where a bunch of Tech fanatics can discuss the latest developments in the Chinese Semiconductor Industry, has changed into what it is today, which is a place where alot of foreign entities are looking to get information.
Sure......all posters should always strike a balance in providing the latest information everyone is craving for but at the same time not giving too much away.