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The first domestic key dimension measurement equipment was launched by SMIC, for the 300mm (12 inch) silicon wafer process
2021/7/6 15:54:13 Source: Author: Yuanyang Editor: YuanyangJuly 6 News Recently, Epistar held the launch ceremony of the country's first critical dimension measurement equipment (CD-SEM), and officially announced that it had won the order and launched the machine SMIC.
▲ The picture is from Dongfang Jingyuan
The key dimension measurement equipment (model: SEpA-c410) released this time is geared towards the 300mm (12 inch) silicon wafer process, which can achieve key dimension measurement with high repeatability, high resolution and high productivity . After entering SMIC, it will pass the actual production line verification to further improve and perfect the equipment performance and move towards the overall goal of industrialization.
In order for chip foundries to produce high-yield chips, in addition to the main process of chip manufacturing, defect detection and the detection of various key dimensions are also indispensable links in the process flow. The 300mm silicon wafer measurement equipment issued by Dongfang Jingyuan is used to evaluate the process of each link within the scope of the effective process . For example, whether the thickness of the film meets the process standard, whether the chip will affect the electrical parameters of the silicon wafer after the completion of the etching process.
The launching ceremony marks that Oriental Epistar has once again made a major product technological breakthrough following its overcoming of electron beam defect detection technology in 2019, filling the gap in the domestic critical dimension measurement equipment (CD-SEM) market.
IT Home has learned that since its establishment, Dongfang Jingyuan has focused on yield control and improvement in key aspects of chip manufacturing. With the joint support of Beijing Municipal Bureau of Economics and Information Technology, Yizhuang Management Committee, National 02 Major Project Group, partners and investors, we have continuously achieved important product technological breakthroughs. The company's computational lithography series software (OPC), electron beam defect detection The equipment (EBI) has passed the verification of the production lines of major international manufacturers and achieved order revenue, and has achieved remarkable results in the field of domestic equipment. The launch of this opportunity, Dongfang Jingyuan has added a vital link to the yield control product line, and has also solved another "stuck neck" problem in the field of chip manufacturing in my country.